-
1
-
-
25144462707
-
A comprehensive review of ZnO materials and devices
-
DOI 10.1063/1.1992666, 041301
-
Ü. Özgür, Ya. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Doǧan, V. Avrutin, S. -J. Cho, and H. Morkoc, J. Appl. Phys. 0021-8979 98, 041301 (2005). 10.1063/1.1992666 (Pubitemid 41348664)
-
(2005)
Journal of Applied Physics
, vol.98
, Issue.4
, pp. 1-103
-
-
Ozgur, U.1
Alivov, Ya.I.2
Liu, C.3
Teke, A.4
Reshchikov, M.A.5
Dogan, S.6
Avrutin, V.7
Cho, S.-J.8
Morko, H.9
-
2
-
-
6444220325
-
-
0079-6425,. 10.1016/j.pmatsci.2004.04.001
-
S. J. Pearton, D. P. Norton, K. Ip, Y. W. Heo, and T. Steiner, Prog. Mater. Sci. 0079-6425 50, 293 (2005). 10.1016/j.pmatsci.2004.04.001
-
(2005)
Prog. Mater. Sci.
, vol.50
, pp. 293
-
-
Pearton, S.J.1
Norton, D.P.2
Ip, K.3
Heo, Y.W.4
Steiner, T.5
-
3
-
-
36549094294
-
-
0021-8979,. 10.1063/1.342419
-
Z. Jin, I. Hamberg, and C. G. Granqvist, J. Appl. Phys. 0021-8979 64, 5117 (1988). 10.1063/1.342419
-
(1988)
J. Appl. Phys.
, vol.64
, pp. 5117
-
-
Jin, Z.1
Hamberg, I.2
Granqvist, C.G.3
-
4
-
-
0001447933
-
-
0163-1829,. 10.1103/PhysRevB.37.10244
-
B. E. Sernelius, K. -F. Berggren, Z. Jin, I. Hamberg, and C. G. Granqvist, Phys. Rev. B 0163-1829 37, 10244 (1988). 10.1103/PhysRevB.37.10244
-
(1988)
Phys. Rev. B
, vol.37
, pp. 10244
-
-
Sernelius, B.E.1
Berggren, K.-F.2
Jin, Z.3
Hamberg, I.4
Granqvist, C.G.5
-
5
-
-
34247881953
-
Carrier concentration dependence of band gap shift in n -type ZnO:Al films
-
DOI 10.1063/1.2721374
-
J. G. Lu, S. Fujita, T. Kawaharamura, H. Nishinaka, Y. Kamada, T. Ohshima, Z. Z. Ye, Y. J. Zeng, Y. Z. Zhang, L. P. Zhu, H. P. He, and B. H. Zhao, J. Appl. Phys. 0021-8979 101, 083705 (2007). 10.1063/1.2721374 (Pubitemid 46691148)
-
(2007)
Journal of Applied Physics
, vol.101
, Issue.8
, pp. 083705
-
-
Lu, J.G.1
Fujita, S.2
Kawaharamura, T.3
Nishinaka, H.4
Kamada, Y.5
Ohshima, T.6
Ye, Z.Z.7
Zeng, Y.J.8
Zhang, Y.Z.9
Zhu, L.P.10
He, H.P.11
Zhao, B.H.12
-
6
-
-
0001260525
-
-
0163-1829,. 10.1103/PhysRevB.25.7836
-
A. P. Roth, J. B. Webb, and D. F. Williams, Phys. Rev. B 0163-1829 25, 7836 (1982). 10.1103/PhysRevB.25.7836
-
(1982)
Phys. Rev. B
, vol.25
, pp. 7836
-
-
Roth, A.P.1
Webb, J.B.2
Williams, D.F.3
-
7
-
-
33646202250
-
-
10.1103/PhysRev.93.632
-
E. Burstein, Phys. Rev. 93, 632 (1954). 10.1103/PhysRev.93.632
-
(1954)
Phys. Rev.
, vol.93
, pp. 632
-
-
Burstein, E.1
-
8
-
-
36048937855
-
-
0370-1301,. 10.1088/0370-1301/67/10/306
-
T. S. Moss, Proc. Phys. Soc. London, Sect. B 0370-1301 67, 775 (1954). 10.1088/0370-1301/67/10/306
-
(1954)
Proc. Phys. Soc. London, Sect. B
, vol.67
, pp. 775
-
-
Moss, T.S.1
-
9
-
-
84919032582
-
-
0001-8732,. 10.1080/00018737800101484
-
R. A. Abram, G. J. Rees, and B. H. L. Wilson, Adv. Phys. 0001-8732 27, 799 (1978). 10.1080/00018737800101484
-
(1978)
Adv. Phys.
, vol.27
, pp. 799
-
-
Abram, R.A.1
Rees, G.J.2
Wilson, B.H.L.3
-
10
-
-
0001371339
-
-
0163-1829,. 10.1103/PhysRevB.24.1971
-
K. F. Berggren and B. E. Sernelius, Phys. Rev. B 0163-1829 24, 1971 (1981). 10.1103/PhysRevB.24.1971
-
(1981)
Phys. Rev. B
, vol.24
, pp. 1971
-
-
Berggren, K.F.1
Sernelius, B.E.2
-
11
-
-
55249083762
-
-
0021-8979,. 10.1063/1.3000601
-
Y. F. Li, B. Yao, Y. M. Lu, Y. Q. Gai, C. X. Cong, Z. Z. Zhang, D. X. Zhao, J. Y. Zhang, B. H. Li, D. Z. Shen, X. W. Fan, and Z. K. Tang, J. Appl. Phys. 0021-8979 104, 083516 (2008). 10.1063/1.3000601
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 083516
-
-
Li, Y.F.1
Yao, B.2
Lu, Y.M.3
Gai, Y.Q.4
Cong, C.X.5
Zhang, Z.Z.6
Zhao, D.X.7
Zhang, J.Y.8
Li, B.H.9
Shen, D.Z.10
Fan, X.W.11
Tang, Z.K.12
-
12
-
-
4944221246
-
-
0021-8979,. 10.1063/1.1769598
-
R. Ghosh, D. Basak, and S. Fujihara, J. Appl. Phys. 0021-8979 96, 2689 (2004). 10.1063/1.1769598
-
(2004)
J. Appl. Phys.
, vol.96
, pp. 2689
-
-
Ghosh, R.1
Basak, D.2
Fujihara, S.3
-
13
-
-
31644432535
-
Strain and its effect on optical properties of Al-N codoped ZnO films
-
DOI 10.1063/1.2161419, 023503
-
H. P. He, F. Zhuge, Z. Z. Ye, L. P. Zhu, F. Z. Wang, B. H. Zhao, and J. Y. Huang, J. Appl. Phys. 0021-8979 99, 023503 (2006). 10.1063/1.2161419 (Pubitemid 43172363)
-
(2006)
Journal of Applied Physics
, vol.99
, Issue.2
, pp. 1-5
-
-
He, H.P.1
Zhuge, F.2
Ye, Z.Z.3
Zhu, L.P.4
Wang, F.Z.5
Zhao, B.H.6
Huang, J.Y.7
-
14
-
-
2342513500
-
-
0003-6951,. 10.1063/1.1705722
-
A. B. M. A. Ashrafi, N. T. Binh, B. Zhang, and Y. Segawa, Appl. Phys. Lett. 0003-6951 84, 2814 (2004). 10.1063/1.1705722
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 2814
-
-
Ashrafi, A.B.M.A.1
Binh, N.T.2
Zhang, B.3
Segawa, Y.4
-
15
-
-
0020089829
-
-
0021-4922,. 10.1143/JJAP.21.264
-
M. Miura, Jpn. J. Appl. Phys., Part 1 0021-4922 21, 264 (1982). 10.1143/JJAP.21.264
-
(1982)
Jpn. J. Appl. Phys., Part 1
, vol.21
, pp. 264
-
-
Miura, M.1
-
16
-
-
0036865314
-
-
0734-2101,. 10.1116/1.1517997
-
O. Kappertz, R. Drese, and M. Wuttig, J. Vac. Sci. Technol. A 0734-2101 20, 2084 (2002). 10.1116/1.1517997
-
(2002)
J. Vac. Sci. Technol. A
, vol.20
, pp. 2084
-
-
Kappertz, O.1
Drese, R.2
Wuttig, M.3
-
17
-
-
0034226403
-
Origin of electrical property distribution on the surface of ZnO:Al films prepared by magnetron sputtering
-
DOI 10.1116/1.582389
-
T. Minami, T. Miyata, T. Yamamoto, and H. Toda, J. Vac. Sci. Technol. A 0734-2101 18, 1584 (2000). 10.1116/1.582389 (Pubitemid 30902753)
-
(2000)
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
, vol.18
, Issue.4
, pp. 1584-1589
-
-
Minami, T.1
Miyata, T.2
Yamamoto, T.3
Toda, H.4
-
18
-
-
69049090571
-
-
JCPDS Card No. 36-1451.
-
JCPDS Card No. 36-1451.
-
-
-
-
19
-
-
0020087557
-
PRESSURE AND ANGLE OF INCIDENCE EFFECTS IN REACTIVE PLANAR MAGNETRON SPUTTERED ZnO LAYERS.
-
DOI 10.1116/1.571350
-
S. Maniv, W. D. Westwood, and E. Colombini, J. Vac. Sci. Technol. 0022-5355 20, 162 (1982). 10.1116/1.571350 (Pubitemid 12519542)
-
(1982)
Journal of vacuum science & technology
, vol.20
, Issue.2
, pp. 162-170
-
-
Maniv, S.1
Westwood, W.D.2
Colombini, E.3
-
21
-
-
0022113552
-
-
0021-4922,. 10.1143/JJAP.24.944
-
K. Tominaga, T. Yuasa, M. Kume, and O. Tada, Jpn. J. Appl. Phys., Part 1 0021-4922 24, 944 (1985). 10.1143/JJAP.24.944
-
(1985)
Jpn. J. Appl. Phys., Part 1
, vol.24
, pp. 944
-
-
Tominaga, K.1
Yuasa, T.2
Kume, M.3
Tada, O.4
-
22
-
-
0000528594
-
-
0021-8979,. 10.1063/1.372101
-
J. W. Tomm, B. Ullrich, X. G. Qiu, Y. Segawa, A. Ohtomo, M. Kawasaki, and H. Koinuma, J. Appl. Phys. 0021-8979 87, 1844 (2000). 10.1063/1.372101
-
(2000)
J. Appl. Phys.
, vol.87
, pp. 1844
-
-
Tomm, J.W.1
Ullrich, B.2
Qiu, X.G.3
Segawa, Y.4
Ohtomo, A.5
Kawasaki, M.6
Koinuma, H.7
|