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EPJ Applied Physics

Volumn 44, Issue 1, 2008, Pages 43-46

Photoresponsivity enhancement of ZnO/Si photodiodes through use of an ultrathin oxide interlayer

(2) Chena, L C a Pan, C N a

a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; EPITAXIAL GROWTH; LITHOGRAPHY; NONMETALS; OPTICAL DESIGN; OXIDE FILMS; PHOTODIODES; SEMICONDUCTING CADMIUM TELLURIDE; SILICON; ZINC OXIDE;

CO-DOPED; OXIDE LAYERS; P-TYPE ZNO FILMS; PHOTO-RESPONSIVITY; SI SUBSTRATE; SILICON SUBSTRATES; ULTRA-THIN OXIDES; ULTRASONIC SPRAY PYROLYSIS;

SPRAY PYROLYSIS;

EID: 52649091337 PISSN: 12860042 EISSN: 12860050 Source Type: Journal
DOI: 10.1051/epjap:2008153 Document Type: Conference Paper

Times cited : (28)

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