Temperature-dependence of ink transport during thermal dip-pen nanolithography

Applied Physics Letters

Volumn 99, Issue 19, 2011, Pages

  Chung, Sungwook ^a   Felts, Jonathan R ^b   Wang, Debin ^a   King, William P ^b   De Yoreo, James J ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b United States of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION BARRIERS; DIP-PEN NANOLITHOGRAPHY; DWELL TIME; EXPONENTIAL DEPENDENCE; FEATURE SIZES; HEATED ATOMIC FORCE MICROSCOPY; INK DISSOLUTION; INK TRANSFER; MERCAPTOHEXADECANOIC ACID; TEMPERATURE DEPENDENCE; THERMAL DIP-PEN NANOLITHOGRAPHY; TIP SPEED;

ADSORPTION; ATOMIC FORCE MICROSCOPY;

NANOLITHOGRAPHY;

EID: 81155144594     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3657777     Document Type: Article

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