Recombination of O and H atoms on the surface of nanoporous dielectrics

IEEE Transactions on Plasma Science

Volumn 37, Issue 9 SPEC. ISS. PART 1, 2009, Pages 1697-1704

  Rakhimova, Tatyana V ^a   Braginsky, Oleg V ^a   Kovalev, Alexander S ^a   Lopaev, Dmitry V ^a   Mankelevich, Yuri A ^a   Malykhin, Evdokim M ^a   Rakhimov, Alexander T ^a   Vasilieva, Anna N ^a   Zyryanov, Sergey M ^a   Baklanov, Mikhail R ^b  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b IMEC   (Belgium)

Author keywords

Dielectric materials; Modeling; Plasma measurements

Indexed keywords

DAMAGE DEPTHS; EXPERIMENTAL DATA; HYDROGEN ATOMS; HYDROPHOBIC GROUPS; LOSS PROBABILITY; LOW-K FILMS; MODELING; NANO-POROUS; NANOPOROUS DIELECTRICS; NANOPOROUS MATERIALS; OXYGEN ATOM; PHOTON FLUX; PLASMA DAMAGE; PLASMA MEASUREMENTS; PLASMA-INDUCED; SURFACE RECOMBINATIONS;

ATOMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; HYDROGEN BONDS; METAL RECOVERY; OXYGEN; PLASMAS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPY; SURFACES;

DIELECTRIC MATERIALS;

EID: 70349462802     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2023991     Document Type: Article

References (8)

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