XPS study of arsenic doped ZnO grown by Atomic Layer Deposition

Journal of Alloys and Compounds

Volumn 582, Issue , 2014, Pages 594-597

  Snigurenko, D ^a   Jakiela, R ^a   Guziewicz, E ^a   Przezdziecka, E ^a   Stachowicz, M ^a   Kopalko, K ^a   Barcz, A ^a   Lisowski, W ^b   Sobczak, J W ^b   Krawczyk, M ^b   Jablonski, A ^b  

^a INSTITUTE OF PHYSICS   (Poland)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

Author keywords

Arsenic; Atomic Layer Deposition; Optical properties; Thin films; X ray photoelectron spectroscopy; Zinc oxide

Indexed keywords

ANNEALING; ARSENIC; ATMOSPHERIC TEMPERATURE; ATOMS; BINDING ENERGY; DEPOSITION; EPITAXIAL GROWTH; FERMI LEVEL; METALLIC FILMS; OPTICAL PROPERTIES; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; SEMICONDUCTOR QUANTUM WELLS; TEMPERATURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ARSENIC DOPED; CORE-LEVEL SPECTRA; EXCITON STATE; HIGH-TEMPERATURE ANNEALING; LOW TEMPERATURE PHOTOLUMINESCENCE; THERMAL-ANNEALING; THREE COMPONENT; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

ATOMIC LAYER DEPOSITION;

EID: 84883637600     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2013.08.061     Document Type: Article

References (26)

1. A.F. Kohan, G. Ceder, D. Morgan, C.G. Van de Walle, Phys. Rev .B 61 (2000) 15019.
2. L.G. Wang, A. Zunger, Physical Review Letters 90 (2003) 256401.
3. Y.R. Ryu, T.S. Lee, H.W. White, Applied Physics Letters 83 (2003) 87.
4. S. Limpijumnong, S. Zhang, S.-H. Wei, C. Park, Physical Review Letters 92 (2004) 155504.
5. B. Puchala, D. Morgan, Physical Review B 85 (2012) 195207.
6. Y.R. Ryu, S. Zhu, D.C. Look, J.M. Wrobel, H.M. Jeong, H.W. White, J. Cryst. Growth 216 (2000) 330.
7. J.C. Sun, J.Z. Zhao, H.W. Liang, J.M. Bian, L.Z. Hu, H.Q. Zhang, X.P. Liang, W.F. Liu, G.T. Du, Applied Physics Letters 90 (2007) 121128.
8. E. Przezdziecka, A. Wierzbicka, A. Reszka, K. Goscinski, A. Droba, R. Jakiela, D. Dobosz, T. Krajewski, K. Kopalko, J.M. Sajkowski, M. Stachowicz, M. Pietrzyk, A. Kozanecki, Journal of Physics D: Applied Physics 46 (2013) 035101.
9. E. Przez dziecka, K. Goscin ski, M. Stachowicz, D. Dobosz, E. Zielony, J.M. Sajkowski, M. Pietrzyk, E. Placzek-Popko, A. Kozanecki, Sensors and Actuators A: Physical (2013).
10. D.C. Look, G.M. Renlund, R.H. Burgener, J.R. Sizelove, Applied Physics Letters 85 (2004) 5269.
11. A. Kumar, M. Kumar, B.P. Singh, Applied Surface Science 256 (2010) 7200.
12. E. Przezdziecka, E. Kamin ska, K.P. Korona, E. Dynowska, W. Dobrowolski, R. Jakiela, L. Klopotowski, J. Kossut, Semiconductor Science and Technology 22 (2007) 10.
13. V. Vaithianathan, B.-T. Lee, S.S. Kim, Applied Physics Letters 86 (2005) 062101.
14. G. Braunstein, A. Muraviev, H. Saxena, N. Dhere, V. Richter, R. Kalish, Applied Physics Letters 87 (2005)p 192103 .
15. M. Ritala, M. Leskela, Handbook of Thin Film Materials (2001).
16. E. Guziewicz, M. Godlewski, L. Wachnicki, T.A. Krajewski, G. Luka, S. Gieraltowska, R. Jakiela, A. Stonert, W. Lisowski, M. Krawczyk, J.W. Sobczak, A. Jablonski, Semiconductor Science and Technology 2012 074011 .
17. L. Wachnicki, T. Krajewski, G. Luka, B. Witkowski, B. Kowalski, K. Kopalko, J.Z. Domagala, M. Guziewicz, M. Godlewski, E. Guziewicz, Thin Solid Films 518 (2010) 4556.
18. J. Sun, H. Liang, J. Zhao, Q. Feng, J. Bian, Z. Zhao, H. Zhang, Y. Luo, L. Hu, G. Du, Applied Surface Science 254 (2008) 7482 .
19. A. Jablonski, Polish Journal Chemistry 74 (2000) 1533.
20. A. Jablonski, Analytical Sciences 26 (2010) 155.
21. M. Ding, B.H.W.S. De Jong, S.J. Roosendaal, A. Vredenberg, Geochimica Et Cosmochimica Acta 64 (2000) 1209.
22. H. Guan, X. Xia, Y. Zhang, F. Gao, W. Li, Journal of Physics: Condensed Matter 20 (2008) 292202.
23. J.C. Fan, C.Y. Zhu, S. Fung, Y.C. Zhong, K.S. Wong, Z. Xie, G. Brauer, W. Anwand, W. Skorupa, C.K. To, B. Yang, C.D. Beling, C.C. Ling, Journal of Applied Physics 106 (2009) 073709.
24. N. Xu, Y. Xu, L. Li, Y. Shen, T. Zhang, J. Wu, J. Sun, Z. Ying, Journal of Vacuum Science & Technology A: Vacuum, Surfaces and Films 24 (2006) 517.
25. H.A. Budz, M.C. Biesinger, R.R. LaPierre, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 27 (2009) 637.
26. G. Du, Y. Cui, X. Xiaochuan, X. Li, H. Zhu, B. Zhang, Y. Zhang, Y. Ma, Applied Physics Letters 90 (2007) 243504.