Swift nanopattern formation of PS- b -PMMA and PS- b -PDMS block copolymer films using a microwave assisted technique

ACS Nano

Volumn 7, Issue 8, 2013, Pages 6583-6596

  Borah, Dipu ^a,b,c   Senthamaraikannan, Ramsankar ^a,b   Rasappa, Sozaraj ^a,b   Kosmala, Barbara ^a,c   Holmes, Justin D ^a,b,c   Morris, Michael A ^a,b,c  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

block copolymers; graphoepitaxy; microwave anneal; plasma etching; polymer brushes; self assembly; silicon nanostructures

Indexed keywords

BLOCK COPOLYMER FILMS; GRAPHOEPITAXY; MICROPHASE SEGREGATION; MICROWAVE ANNEAL; MICROWAVE-ASSISTED TECHNIQUE; POLYMER BRUSHES; SILICON NANO STRUCTURES; TRANSLATIONAL ALIGNMENT;

BLOCK COPOLYMERS; CYLINDERS (SHAPES); MICROCHANNELS; MICROWAVES; PLASMA ETCHING; POLYSTYRENES; SELF ASSEMBLY;

SILICONES;

EID: 84883238362     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn4035519     Document Type: Article

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