Controlled modification of mono- and bilayer graphene in O2, H2 and CF4 plasmas

Nanotechnology

Volumn 24, Issue 35, 2013, Pages

  Felten, A ^a   Eckmann, A ^b   Pireaux, J J ^a   Krupke, R ^c,d   Casiraghi, C ^b,e  

^a UNIVERSITY OF NAMUR   (Belgium)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^d DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^e FREIE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED MODIFICATION; COVALENT MODIFICATIONS; FUNCTIONALIZATION PROCESS; FUNCTIONALIZATIONS; PLASMA CONDITIONS; SATURATION COVERAGE; TETRAFLUOROMETHANE; VARYING PARAMETERS;

ETCHING; OXYGEN; PHOTOELECTRONS; PLASMA THEORY; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAPHENE;

EID: 84882277020     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/35/355705     Document Type: Article

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