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Plasma Sources Science and Technology

Volumn 10, Issue 2, 2001, Pages 311-317

Plasma chemistry and surface processes of negative ions

(3) Stoffels, E a Stoffels, W W a Kroesen, G M W a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; ELECTRONS; GROUND STATE; IONS; MOLECULES; NEGATIVE IONS; SURFACES;

ATTACHMENT CROSS SECTIONS; DISSOCIATIVE ELECTRON ATTACHMENT; PLASMA CHEMISTRY; SHEATH COLLISIONS;

PLASMA SHEATHS;

EID: 0035332335 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/10/2/321 Document Type: Article

Times cited : (59)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.