Controlled oxidative functionalization of monolayer graphene by water-vapor plasma etching

Carbon

Volumn 50, Issue 8, 2012, Pages 3039-3044

  Liu, Lei ^a   Xie, Donglin ^b   Wu, Muhong ^a   Yang, Xiaoxia ^a   Xu, Zhi ^a   Wang, Wenlong ^a   Bai, Xuedong ^a   Wang, Enge ^b  

^a INSTITUTE OF PHYSICS   (China)

^b PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BASAL PLANES; CARBON LATTICES; CARBON NETWORK; CONTINUUM PERCOLATION; ELECTRICAL CONDUCTION; GRAPHENE SHEETS; OXIDATIVE FUNCTIONALIZATION; PLASMA DRY ETCHING; SPUTTERING EFFECTS; STEP-BY-STEP; TRANSPORT OF CARRIERS; VARIABLE RANGE HOPPING;

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; FREE RADICALS; FUNCTIONAL GROUPS; GRAPHENE; MONOLAYERS; PLASMA ETCHING; RAMAN SPECTROSCOPY; SOLVENTS; X RAY PHOTOELECTRON SPECTROSCOPY;

WATER VAPOR;

EID: 84862796728     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2012.02.090     Document Type: Article

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