Investigation of the dependence of the chemical states of the graphene surface on N 2 plasma treatment

Journal of the Korean Physical Society

Volumn 60, Issue 6, 2012, Pages 933-936

  Jung, Ranju ^a   Cheong, Jae Kwan ^b  

^a Kwangwoon University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Graphene; Plasma; Raman Spectroscopy; Surface; XPS

Indexed keywords

EID: 84860005353     PISSN: 03744884     EISSN: 19768524     Source Type: Journal    
DOI: 10.3938/jkps.60.933     Document Type: Article

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