Effect of annealing on the electronic parameters of Au/ poly(ethylmethacrylate)/n-InP Schottky diode with organic interlayer

Current Applied Physics

Volumn 13, Issue 8, 2013, Pages 1604-1610

  Rajagopal Reddy, V ^a   Umapathi, A ^a   Dasaradha Rao, L ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

Au PEMA n InP Schottky diode; I V and C V characteristics; Interface state density; Series resistance

Indexed keywords

CAPACITANCE VOLTAGE MEASUREMENTS; EFFECTIVE BARRIER HEIGHTS; ELECTRONIC MODIFICATIONS; I-V AND C-V CHARACTERISTICS; INTERFACE STATE DENSITY; POLY-(ETHYLMETHACRYLATE); SCHOTTKY DIODES; SERIES RESISTANCES;

ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; GOLD; INTERFACE STATES; SCHOTTKY BARRIER DIODES;

ANNEALING;

EID: 84880532272     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2013.06.001     Document Type: Article

References (57)

1. J. Lei, W. Liang, C.J. Brumlik, and C.R. Martin Synth. Met 47 1992 351
2. M. Willander, A. Assadi, and C. Svensson Synth. Met 55-57 1993 4099
3. M.E. Aydin, and A. Turut Microelectron. Eng. 84 12 2007 2875
4. M. Zhu, T.H. Cui, and K. Varahramyan Microelectron. Eng. 75 3 2004 269
5. G. Lloyd, M. Raja, I. Sellers, N. Sedghi, R. Di Lucrezia, S. Higgins, and B. Eccleston Microelectron. Eng. 59 2001 323
6. S.A. Moiz, M.M. Ahmed, and K.S. Karimov ETRI J. 27 3 2005 319
7. Y. Sakamoto, T. Sugino, T. Miyazaki, and J. Shirafuji Electron. Lett. 31 1995 1104
8. T. Sugino, H. Ito, and J. Shirafuji Electron. Lett. 26 1990 1750
9. H.C. Card, and E.H. Rhoderick J. Phys. D: Appl. Phys. 7 1971 1589
10. S. Aydogan, M. Saglam, and A. Turut Polymer 46 2005 10982
11. K. Hattori, and Y. Toril Solid-State Electron 34 1991 527
12. T. Sugino, Y. Sakamoto, T. Sugiguchi, K. Nomoto, and J. Shirafuji Jpn. J. Appl. Phys. 32 1993 L1196
13. O. Gull, S. Aydogan, and A. Turut Microelectronic. Eng. 85 2008 1647
14. B. Abay, Y. Onganer, M. Saglam, H. Efeoglu, A. Turut, and Y.K. Yogurtcu Microelectronics. Eng. 51-52 2000 689
15. R.K. Gupta, and R.A. Singh Mater. Chem. Phys. 86 2004 279
16. R.K. Gupta, and R.A. Singh Mater. Sci. Semicond. Process 7 2004 83
17. L.-M. Huang, T.-C. Wen, and A. Gopalan Thin Solid Films 473 2005 300
18. N.C. Nguyen, and K. Potje-Kamloth Thin Solid Films 338 1999 142
19. M.C. Petty, and M. Bryce An Introduction to Molecular Electronics 1995 Oxford University Press New York
20. J. Jortner, and M.A. Ratner Molecular Electronics 1997 American Chemical Society Washington DC
21. M.E. Aydin, F. Yakuphanoglu, J.H. Eom, and D.H. Hwang Phys. B 387 2007 239
22. O. Gullu, M. Cankaya, M. Biber, and A. Turut J. Phys. Condens. Matter 20 2008 215210
23. O. Gullu, O. Baris, M. Biber, and A. Turut Appl. Surf. Sci. 254 2008 3039
24. O. Gullu MicroElectron. Eng. 87 2010 648
25. M. Soylu, B. Abay, and Y. Onganer J. Phys. Chem. Solids 71 2010 1398
26. A.A.M. Farag, and I.S. Yahia Synth. Met. 161 2011 32
27. O. Gullu, S. Aydogan, and A. Turut Thin Solid Films 520 2012 1944
28. M. Enver Aydin, and F. Yakuphanoglu Microelectron. Reliab. 52 2012 1350
29. V. Rajagopal Reddy, M. Siva Pratap Reddy, A. Ashok Kumar, and Chel-Jong Choi Thin Solid Films 520 2012 5715
30. J. Reiter, O. Krejza, and M. Sedlarikova Sol. Energy Mater. Sol. Cells 93 2009 249
31. S.M. Sze Physics of Semiconductor Devices second ed. 1981 Wiley New York
32. R.H. Williams, and G.Y. Robinson C.W. Wilmsen, Physics and Chemistry of III-V Compound Semiconductor Interfaces 1985 Plenum Press New York
33. R.F. Schmitsdorf, T.U. Kampen, and W. Monch J. Vac. Sci. Technol. B 15 1997 1221
34. W. Monch J. Vac. Sci. Technol. B 17 1999 1867
35. G.M. Vanalme, L. Goubert, R.L. Van Meirhaeghe, F. Cardon, and P. Van Daele Semicond. Sci. Technol. 14 1999 871
36. E.H. Rhoderick, and R.H. Williams Metal-Semiconductor Contacts second ed. 1988 Clarendon Oxford 33
37. N.G. Semaltianos Microelectron. J. 38 2007 754
38. N. Szydlo, and J. Oliver J. Appl. Phys. 50 1979 1445
39. Z. Benemara, B. Akkal, A. Talbi, B. Gruzza, and L. Bideux Mater. Sci. Eng. C 21 2002 287
40. Z.Q. Shi, R. Wallace, and W.A. Anderson Appl. Phys. Lett. 59 1991 446
41. S.K. Cheung, and N.W. Cheung Appl. Phys. Lett. 49 1986 85
42. T. Kilicoglu Thin Solid Films 516 2008 967
43. H. Norde J. Appl. Phys. 50 1979 5052
44. S.R. Forrest, and P.H. Schmidt J. Appl. Phys. 59 1968 513
45. S. Antohe, N. Tomozeiu, and S. Gogonea Phys. Status Solidi A 125 1997 397
46. E. Ayyildiz, A. Turut, H. Efeoglu, S. Tuzement, M. Saglam, and Y.K. Yogurtcu Solid-State Electron. 39 1996 83
47. P. Cova, A. Singh, and R.A. Masut J. Appl. Phys. 82 1997 5217
48. X.J. Wang, and L. He Electron. Mater. 27 1998 1272
49. R.T. Tung Phys. Rev. B 45 1992 13502
50. Y.F. Tsay, B. Gong, and S.S. Mitra Phys. Rev. B 6 6 1972 2330
51. Y.P. Song, R.L. Van Meirhaeghe, W.H. Laflare, and F. Cardon Solid-State Electron 29 6 1986 633
52. S. Okur, F. Yakuphanoglu, M. Ozsoz, and P.K. Kadayifcilar Microelectron. Eng. 86 2009 2305
53. S. Pandey, and S. Kal Solid-State Electron 42 1998 943
54. L.M. Terman Solid-State Electron 5 1962 285
55. S. Aydogan, M. Saglam, and A. Turut Microelectron. Eng. 85 2008 278
56. M. Cakar, N. Yildrim, H. Dogan, and A. Turut Appl. Surf. Sci. 253 2007 3464
57. J.Y. Duboz, F. Binet, N. Laurent, E. Rosencher, F. Scholz, V. Harle, O. Briot, B. Gil, and R.L. Aulombard Mater. Res. Soc. Symp. Proc. 449 1996 1085