Recording low and high spatial frequencies in exit wave reconstructions

Ultramicroscopy

Volumn 133, Issue , 2013, Pages 26-34

  Haigh, S J ^a   Jiang, B ^b   Alloyeau, D ^c   Kisielowski, C ^c   Kirkland, A I ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b Thermo Fisher Scientific   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Aberration correction; Exit wave restoration; TEM

Indexed keywords

ABERRATION CORRECTION; ABERRATION-CORRECTED; D. TRANSMISSION ELECTRON MICROSCOPES (TEM); EXIT WAVES; HIGH SPATIAL FREQUENCY; IMAGING CONDITIONS; LOW-SPATIAL FREQUENCY; SPATIAL FREQUENCY;

MICROSCOPIC EXAMINATION; MOLECULAR PHYSICS;

TRANSMISSION ELECTRON MICROSCOPY;

ARTICLE; CONTROLLED STUDY; ELECTRON MICROSCOPE; ELECTRON TRANSPORT; EQUIPMENT DESIGN; FREQUENCY ANALYSIS; IMAGE ANALYSIS; IMAGE PROCESSING; IMAGE RECONSTRUCTION; MATHEMATICAL COMPUTING; MATHEMATICAL MODEL; PHASE CONTRAST MICROSCOPY; PROCESS CONTROL; PROCESS DESIGN; PROCESS OPTIMIZATION; PROCESS TECHNOLOGY; SPATIAL ANALYSIS; THEORETICAL STUDY; TRANSMISSION ELECTRON MICROSCOPY; WAVELET ANALYSIS;

ABERRATION CORRECTION; EXIT WAVE RESTORATION; TEM;

IMAGE PROCESSING, COMPUTER-ASSISTED; MICROSCOPY, ELECTRON, TRANSMISSION;

EID: 84878907642     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2013.04.012     Document Type: Article

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