SCOPUS 정보 검색 플랫폼

Volumn 579, Issue , 2013, Pages 160-164

P-Type NiZnO thin films grown by photo-assist metal-organic chemical vapor deposition

(9) Wang, Jin a Dong, Xin a Zhang, Baolin a Zhang, Yuantao a Wang, Hui a Shi, Zhifeng a Zhang, Shikai a Yin, Wei a Du, Guotong a

a JILIN UNIVERSITY (China)

Author keywords

Electrical characteristics; MOCVD; NiZnO

Indexed keywords

DEFECTS; DEPOSITION; HOLE CONCENTRATION; INDUSTRIAL CHEMICALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NICKEL; ORGANIC CHEMICALS; ORGANOMETALLICS; THIN FILMS;

DEFECT LEVELS; ELECTRICAL CHARACTERISTIC; METAL ORGANIC; NIZNO; P-TYPE; PHOTOLUMINESCENCE MEASUREMENTS;

VAPOR DEPOSITION;

EID: 84878703649 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2013.04.192 Document Type: Article

Times cited : (13)

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