Properties of ZnO thin films grown on Si substrates by photo-assisted MOCVD

Applied Surface Science

Volumn 254, Issue 7, 2008, Pages 2081-2084

  Li, Xiangping ^a   Zhang, Baolin ^a   Zhu, Huichao ^a   Dong, Xin ^b   Xia, Xiaochuan ^a   Cui, Yongguo ^b   Huang, Keke ^c   Du, Guotong ^a,b  

^a JILIN UNIVERSITY   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^c Jilin University   (China)

Author keywords

AFM; Photo assisted MOCVD; Photoluminescence; XRD spectra; ZnO films

Indexed keywords

LIGHT SOURCES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; SURFACE MORPHOLOGY; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTALLINITY; LIGHT IRRADIATION; ZNO FILMS;

THIN FILMS;

EID: 37749002787     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.08.056     Document Type: Article

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