-
2
-
-
0026259592
-
-
10.1109/58.108863
-
T. A. Rost, T. A. Rabson, B. A. Stone, D. L. Callahan, and R. C. Baumann, IEEE Trans. Ultrason. Ferroelectr. Freq. Contr. 38, 640 (1991). 10.1109/58.108863
-
(1991)
IEEE Trans. Ultrason. Ferroelectr. Freq. Contr.
, vol.38
, pp. 640
-
-
Rost, T.A.1
Rabson, T.A.2
Stone, B.A.3
Callahan, D.L.4
Baumann, R.C.5
-
5
-
-
33745572395
-
3 thin film on silicon by laser irradiation and ion implantation-induced layer transfer
-
DOI 10.1002/adma.200502364
-
Y. B. Park, B. Min, K. J. Vahala, and H. A. Atwater, Adv. Mater. 18, 1533 (2006). 10.1002/adma.200502364 (Pubitemid 43979513)
-
(2006)
Advanced Materials
, vol.18
, Issue.12
, pp. 1533-1536
-
-
Park, Y.-B.1
Min, B.2
Vahala, K.J.3
Atwater, H.A.4
-
6
-
-
71949129879
-
-
10.1063/1.3272108
-
L. Z. Hao, J. Zhu, W. B. Luo, H. Z. Zeng, Y. R. Li, W. Huang, X. W. Liao, and Y. Zhang, Appl. Phys. Lett. 95, 232907 (2009). 10.1063/1.3272108
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 232907
-
-
Hao, L.Z.1
Zhu, J.2
Luo, W.B.3
Zeng, H.Z.4
Li, Y.R.5
Huang, W.6
Liao, X.W.7
Zhang, Y.8
-
7
-
-
36449003708
-
Growth of highly textured LiNbO3 thin film on Si with MgO buffer layer through the sol-gel process
-
DOI 10.1063/1.115842, PII S0003695196027180
-
J. G. Yoon and K. Kim, Appl. Phys. Lett. 68, 2523 (1996). 10.1063/1.115842 (Pubitemid 126683963)
-
(1996)
Applied Physics Letters
, vol.68
, Issue.18
, pp. 2523-2525
-
-
Yoon, J.-G.1
Kim, K.2
-
8
-
-
0000745282
-
The role of Si3N4 layers in determining the texture of sputter deposited LiNbO3 thin films
-
DOI 10.1063/1.116270, PII S0003695196037199
-
S. Tan, T. E. Schlesinger, and M. Migliuolo, Appl. Phys. Lett. 68, 2651 (1996). 10.1063/1.116270 (Pubitemid 126683857)
-
(1996)
Applied Physics Letters
, vol.68
, Issue.19
, pp. 2651-2653
-
-
Tan, S.1
Schlesinger, T.E.2
Migliuolo, M.3
-
9
-
-
0035822545
-
2/Si thin film layered structures
-
DOI 10.1088/0022-3727/34/15/305, PII S0022372701242107
-
M. Tomar, V. Gupta, A. Mansingh, and K. Sreenivas, J. Phys. D: Appl. Phys. 34, 2267 (2001). 10.1088/0022-3727/34/15/305 (Pubitemid 32748622)
-
(2001)
Journal of Physics D: Applied Physics
, vol.34
, Issue.15
, pp. 2267-2273
-
-
Tomar, M.1
Gupta, V.2
Mansingh, A.3
Sreenivas, K.4
-
10
-
-
77957741771
-
-
10.1109/JLT.2010.2072906
-
S. Shandilya, M. Tomar, K. Sreenivas, and V. Gupta, J. Lightwave Tech. 28, 3004 (2010). 10.1109/JLT.2010.2072906
-
(2010)
J. Lightwave Tech.
, vol.28
, pp. 3004
-
-
Shandilya, S.1
Tomar, M.2
Sreenivas, K.3
Gupta, V.4
-
11
-
-
4644311059
-
-
10.1557/JMR.2004.0322
-
V. Gupta, P. Bhattacharya, Y. I. Yuzyuk, R. S. Katiyar, M. Tomar, and K. Sreenivas, J. Mater. Res. 19, 2235 (2004). 10.1557/JMR.2004.0322
-
(2004)
J. Mater. Res.
, vol.19
, pp. 2235
-
-
Gupta, V.1
Bhattacharya, P.2
Yuzyuk, Y.I.3
Katiyar, R.S.4
Tomar, M.5
Sreenivas, K.6
-
12
-
-
67449084415
-
-
10.1063/1.3121509
-
S. Shandilya, M. Tomar, K. Sreenivas, and V. Gupta, J. Appl. Phys. 105, 094105 (2009). 10.1063/1.3121509
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 094105
-
-
Shandilya, S.1
Tomar, M.2
Sreenivas, K.3
Gupta, V.4
-
13
-
-
0000475237
-
-
10.1063/1.366155
-
J. Gonzalo, C. N. Afonso, J. M. Ballesteros, A. Grosman, and C. Ortega, J. Appl. Phys. 82, 3129 (1997). 10.1063/1.366155
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 3129
-
-
Gonzalo, J.1
Afonso, C.N.2
Ballesteros, J.M.3
Grosman, A.4
Ortega, C.5
-
14
-
-
0000167918
-
-
10.1063/1.361407
-
S. Tan, T. Gilbert, C. Y. Hung, T. E. Schlesinger, and M. Migliuolo, J. Appl. Phys. 79, 3548 (1996). 10.1063/1.361407
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 3548
-
-
Tan, S.1
Gilbert, T.2
Hung, C.Y.3
Schlesinger, T.E.4
Migliuolo, M.5
-
15
-
-
34547752936
-
3 thin film for metal ferroelectric semiconductor field effect transistor (MFSFET) application
-
DOI 10.1080/10584580108010840, PII 752392306, 13th International Symposium on Integrated Ferroelectrics
-
X. G. Wang, J. Zhu, H. Z. Zhang, T. C. Lee, T. Vo, T. A. Rabson, and M. A. Robert, Integrated Ferroelectrics 40, 171 (2001). 10.1080/10584580108010840 (Pubitemid 47227397)
-
(2001)
Integrated Ferroelectrics
, vol.40
, Issue.1-5
, pp. 171-180
-
-
Wang, X.1
Zhu, J.2
Zhang, H.3
Lee, T.-C.4
Vo, T.5
Rabson, T.A.6
Robert, M.A.7
-
16
-
-
4043178553
-
-
10.1063/1.1766085
-
Z. Xu, B. Kaczer, J. Johnson, D. Wouters, and G. Groeseneken, J. Appl. Phys. 96, 1614 (2004). 10.1063/1.1766085
-
(2004)
J. Appl. Phys.
, vol.96
, pp. 1614
-
-
Xu, Z.1
Kaczer, B.2
Johnson, J.3
Wouters, D.4
Groeseneken, G.5
-
17
-
-
34548435237
-
Electrical properties of Cr-doped BiFeO3 thin films fabricated on the p -type Si (100) substrate by chemical solution deposition
-
DOI 10.1063/1.2769786
-
S. U. Lee, S. S. Kim, H. K. Jo, M. H. Park, J. W. Kim, and A. S. Bhalla, J. Appl. Phys. 102, 044107 (2007). 10.1063/1.2769786 (Pubitemid 47354001)
-
(2007)
Journal of Applied Physics
, vol.102
, Issue.4
, pp. 044107
-
-
Lee, S.U.1
Kim, S.S.2
Jo, H.K.3
Park, M.H.4
Kim, J.W.5
Bhalla, A.S.6
-
18
-
-
0000889915
-
9 memory capacitor on Si with a silicon nitride buffer
-
DOI 10.1063/1.121008, PII S0003695198002101
-
J. P. Han and T. P. Ma, Appl. Phys. Lett. 72, 1185 (1998). 10.1063/1.121008 (Pubitemid 128677836)
-
(1998)
Applied Physics Letters
, vol.72
, Issue.10
, pp. 1185-1186
-
-
Han, J.-P.1
Ma, T.P.2
-
19
-
-
33846964495
-
-
10.1063/1.2450642
-
M. W. Allen, P. Miller, R. J. Reeves, and S. M. Durbin, Appl. Phys. Lett. 90, 062104 (2007). 10.1063/1.2450642
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 062104
-
-
Allen, M.W.1
Miller, P.2
Reeves, R.J.3
Durbin, S.M.4
-
20
-
-
66549112549
-
-
10.1063/1.3147859
-
M. H. Tang, Z. H. Sun, Y. C. Zhou, Y. Sugiyama, and H. Ishiwara, Appl. Phys. Lett. 94, 212907 (2009). 10.1063/1.3147859
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 212907
-
-
Tang, M.H.1
Sun, Z.H.2
Zhou, Y.C.3
Sugiyama, Y.4
Ishiwara, H.5
-
21
-
-
0035953718
-
3)/GaN capacitor with low interface state density
-
DOI 10.1049/el:20010403
-
T. S. Lay, W. D. Liu, M. Hong, J. Kwo, and J. P. Mannaerts, Elect. Lett. 37, 595 (2001). 10.1049/el:20010403 (Pubitemid 32445677)
-
(2001)
Electronics Letters
, vol.37
, Issue.9
, pp. 595-597
-
-
Lay, T.S.1
Liu, W.D.2
Hong, M.3
Kwo, J.4
Mannaerts, J.P.5
-
22
-
-
0036530989
-
3/GaN MFS structures
-
DOI 10.1016/S0022-0248(01)02152-2, PII S0022024801021522
-
M. S. Kumar, R. R. Sumathi, N. V. Giridharan, R. Jayavel, and J. Kumar, J. Crys. Growth 237-239, 1176 (2002). 10.1016/S0022-0248(01)02152-2 (Pubitemid 34545099)
-
(2002)
Journal of Crystal Growth
, vol.237-239
, Issue.II1-4
, pp. 1176-1179
-
-
Senthil Kumar, M.1
Sumathi, R.R.2
Giridharan, N.V.3
Jayavel, R.4
Kumar, J.5
-
23
-
-
34249047403
-
Hysteretic metal-ferroelectric-semiconductor capacitors based on PZT/ZnO heterostructures
-
DOI 10.1088/0022-3727/40/8/003, PII S0022372707384751, 003
-
E. Cagin, D. Y. Chen, J. J. Siddiqui, and J. D. Phillips, J. Phys. D: Appl. Phys. 40, 2430 (2007). 10.1088/0022-3727/40/8/003 (Pubitemid 46778369)
-
(2007)
Journal of Physics D: Applied Physics
, vol.40
, Issue.8
, pp. 2430-2434
-
-
Cagin, E.1
Chen, D.Y.2
Siddiqui, J.J.3
Phillips, J.D.4
-
24
-
-
84856374822
-
-
10.1016/j.tsf.2011.10.048
-
L. Z. Hao, J. Zhu, Y. J. Liu, S. L. Wang, H. Z. Zeng, X. W. Liao, Y. Y. Liu, H. W. Lei, Y. Zhang, W. L. Zhang, and Y. R. Li, Thin Solid Films 520, 3035 (2012). 10.1016/j.tsf.2011.10.048
-
(2012)
Thin Solid Films
, vol.520
, pp. 3035
-
-
Hao, L.Z.1
Zhu, J.2
Liu, Y.J.3
Wang, S.L.4
Zeng, H.Z.5
Liao, X.W.6
Liu, Y.Y.7
Lei, H.W.8
Zhang, Y.9
Zhang, W.L.10
Li, Y.R.11
-
25
-
-
7044224488
-
-
10.1063/1.1790604
-
W. C. Yang, B. J. Rodriguez, A. Gruverman, and R. J. Nemanich, Appl. Phys. Lett. 85, 2316 (2004). 10.1063/1.1790604
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 2316
-
-
Yang, W.C.1
Rodriguez, B.J.2
Gruverman, A.3
Nemanich, R.J.4
-
27
-
-
54949083005
-
-
10.1063/1.3003877
-
Zhen Guo, Dongxu Zhao, Yichun Liu, Dezhen Shen, Jiying Zhang, and Binghui Li, Appl. Phys. Lett. 93, 163501 (2008). 10.1063/1.3003877
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 163501
-
-
Guo, Z.1
Zhao, D.2
Liu, Y.3
Shen, D.4
Zhang, J.5
Li, B.6
-
28
-
-
33751567031
-
3 heterojunction
-
DOI 10.1063/1.2393148
-
S. M. Guo, Y. G. Zhao, C. M. Xiong, and P. L. Lang, Appl. Phys. Lett. 89, 223506 (2006). 10.1063/1.2393148 (Pubitemid 44847625)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.22
, pp. 223506
-
-
Guo, S.M.1
Zhao, Y.G.2
Xiong, C.M.3
Lang, P.L.4
-
29
-
-
77955864490
-
-
10.1063/1.3460108
-
Jiagang Wu and John Wang, J. Appl. Phys. 108, 034102 (2010). 10.1063/1.3460108
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 034102
-
-
Wu, J.1
Wang, J.2
|