Si and SiGe nanowires: Fabrication process and thermal conductivity measurement by 3ω-scanning thermal microscopy

Journal of Physical Chemistry C

Volumn 117, Issue 17, 2013, Pages 9025-9034

  Grauby, Stéphane ^a   Puyoo, Etienne ^a,b,c   Rampnoux, Jean Michel ^a   Rouvière, Emmanuelle ^b   Dilhaire, Stefan ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

^b CEA GRENOBLE   (France)

^c INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; FABRICATION PROCESS; MEASUREMENT METHODS; SCANNING THERMAL MICROSCOPY; THERMAL CONDUCTIVITY MEASUREMENTS; THERMAL MEASUREMENTS; THERMOELECTRICS; VAPOR-LIQUID-SOLID PROCESS;

IMAGING TECHNIQUES; NANOWIRES; SILICON; SILICON ALLOYS; VAPORS;

THERMAL CONDUCTIVITY OF SOLIDS;

EID: 84877083272     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp4018822     Document Type: Article

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