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Journal of Applied Physics

Volumn 109, Issue 2, 2011, Pages

Scanning thermal microscopy of individual silicon nanowires

(5) Puyoo, Etienne a,b Grauby, St́phane a Rampnoux, Jean Michel a Rouvìre, Emmanuelle b Dilhaire, Stefan a

a UNIVERSITÉ DE BORDEAUX (France)

b CEA GRENOBLE (France)

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; MEAN VALUES; NANO SPHERE LITHOGRAPHY; ONE-DIMENSIONAL NANOSTRUCTURE; SCANNING THERMAL MICROSCOPY; SILICON NANOWIRES; STATISTICAL PROCESSING; THERMAL CONTACT RESISTANCE; THERMAL DATA; THERMAL IMAGES; THERMAL IMAGING; THERMAL MEASUREMENTS; THERMAL PARAMETERS; THERMAL RESISTANCE; VERTICALLY ALIGNED; WET-CHEMICAL ETCHING;

CONTACT RESISTANCE; INFRARED IMAGING; LITHOGRAPHY; NANOWIRES; PROBES; THERMAL CONDUCTIVITY; THERMAL CONDUCTIVITY OF SOLIDS; WET ETCHING;

SILICON;

EID: 79551655251 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3524223 Document Type: Article

Times cited : (83)

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