Thickness dependent self limiting 1-D tin oxide nanowire arrays by nanosecond pulsed laser irradiation

Nanoscale

Volumn 3, Issue 3, 2011, Pages 1090-1101

  Shirato, N ^a   Strader, J ^a,b   Kumar, A ^c   Vincent, A ^c   Zhang, P ^c   Karakoti, A ^d   Nacchimuthu, P ^d   Cho, H J ^c   Seal, S ^c   Kalyanaraman, R ^a,b  

^a University of Tennessee Knoxville   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

^c UNIVERSITY OF CENTRAL FLORIDA   (United States)

^d PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE SURFACE AREA; CHARACTERISTIC THICKNESS; ELECTRICAL NOISE; ENERGY SOURCE; EVAPORATION RATE; FINITE ELEMENT MODELING; LASER ENERGIES; LASER ENERGY DENSITY; LASER INTERFERENCE; NANOSCALE LASERS; NANOSECOND PULSED LASER; NANOWIRE ARRAYS; NANOWIRE FORMATION; NON-MONOTONIC FUNCTION; RECOVERY TIME; ROOM TEMPERATURE; SELF-LIMITING EFFECT; SENSOR PERFORMANCE; TEMPERATURE RISE; THERMAL MODELING; THERMOCAPILLARY FLOW; TIN OXIDE NANOWIRES; ULTRA-THIN; ULTRAVIOLET WAVELENGTH;

ASPECT RATIO; CAPILLARY FLOW; ELECTRIC WIRE; EVAPORATION; HEATING; HYDROGEN; HYDROGEN STORAGE; LASER HEATING; NANOWIRES; PHASE TRANSITIONS; SENSORS; SILICON COMPOUNDS; TIN; TIN OXIDES; ULTRAFAST LASERS; ULTRAVIOLET LASERS;

PULSED LASERS;

NANOMATERIAL; TIN DERIVATIVE; TIN DIOXIDE;

ARTICLE; CHEMISTRY; CONFORMATION; DRUG EFFECT; LASER; MACROMOLECULE; MATERIALS TESTING; RADIATION DOSE; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

LASERS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; RADIATION DOSAGE; SURFACE PROPERTIES; TIN COMPOUNDS;

EID: 79952660863     PISSN: 20403364     EISSN: 20403372     Source Type: Journal    
DOI: 10.1039/c0nr00689k     Document Type: Article

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