Versatility of a hard X-ray Kirkpatrick-Baez focus characterized by ptychography

Journal of Synchrotron Radiation

Volumn 20, Issue 3, 2013, Pages 490-497

  Giewekemeyer, Klaus ^a,b   Wilke, Robin N ^a   Osterhoff, Markus ^a   Bartels, Matthias ^a   Kalbfleisch, Sebastian ^a   Salditt, Tim ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b EUROPEAN XFEL GMBH   (Germany)

Author keywords

beamlines and optics; imaging; Kirkpatrick Baez mirrors; ptychography

Indexed keywords

BEAM-LINES; COHERENT X-RAY DIFFRACTIVE IMAGING; FOCUSING MIRRORS; ILLUMINATION CONDITIONS; KIRKPATRICK-BAEZ; KIRKPATRICK-BAEZ MIRROR; PTYCHOGRAPHY; SPATIAL FILTERS;

IMAGING TECHNIQUES; MIRRORS;

X RAYS;

ARTICLE; BEAMLINES AND OPTICS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; IMAGE QUALITY; IMAGING; KIRKPATRICK-BAEZ MIRRORS; METHODOLOGY; MICROSCOPY; OPTICAL INSTRUMENTATION; PTYCHOGRAPHY; THEORETICAL MODEL;

BEAMLINES AND OPTICS; IMAGING; KIRKPATRICK-BAEZ MIRRORS; PTYCHOGRAPHY;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LENSES; MICROSCOPY; MODELS, THEORETICAL; RADIOGRAPHIC IMAGE ENHANCEMENT;

EID: 84876578694     PISSN: 09090495     EISSN: 16005775     Source Type: Journal    
DOI: 10.1107/S0909049513005372     Document Type: Article

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