Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Applied Physics Letters

Volumn 90, Issue 5, 2007, Pages

  Mimura, Hidekazu ^a   Yumoto, Hirokatsu ^a   Matsuyama, Satoshi ^a   Sano, Yasuhisa ^a   Yamamura, Kazuya ^a   Mori, Yuzo ^a   Yabashi, Makina ^b   Nishino, Yoshinori ^c   Tamasaku, Kenji ^c   Ishikawa, Tetsuya ^c   Yamauchi, Kazuto ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c SPring 8/RIKEN ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRY; MACHINING; MIRRORS; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; SPECTROSCOPIC ANALYSIS;

ELASTIC EMISSION MACHINING; ENERGY-TUNABLE FOCUSING; NANOFOCUSED X RAYS;

X RAY ANALYSIS;

EID: 33846973993     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2436469     Document Type: Article

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