Ptychographic characterization of the wavefield in the focus of reflective hard X-ray optics

Ultramicroscopy

Volumn 110, Issue 4, 2010, Pages 325-329

  Kewish, Cameron M ^a   Thibault, Pierre ^a   Dierolf, Martin ^b   Bunk, Oliver ^a   Menzel, Andreas ^a   Vila Comamala, Joan ^a   Jefimovs, Konstantins ^c   Pfeiffer, Franz ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Diffractive imaging; Phase retrieval; Ptychography; Wavefront characterization; X ray optics

Indexed keywords

DIFFRACTIVE IMAGING; FOCUSED BEAMS; HARD X-RAY MIRRORS; HARD X-RAY OPTICS; NANO-FOCUSING; PHASE RETRIEVAL; PTYCHOGRAPHY; WAVEFIELDS;

WAVEFRONTS; X RAY OPTICS;

X RAYS;

ARTICLE; CONTROLLED STUDY; ELECTRON BEAM; IMAGE ANALYSIS; IMAGE PROCESSING; IMAGING SYSTEM; OPTICS; PROCESS OPTIMIZATION; PTYCHOGRAPHY; RADIOFREQUENCY; SCANNING ELECTRON MICROSCOPY; X RAY;

EID: 77649191802     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.01.004     Document Type: Article

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