SCOPUS 정보 검색 플랫폼

Physica Status Solidi - Rapid Research Letters

Volumn 7, Issue 1-2, 2013, Pages 50-63

Review of 3D topological insulator thin-film growth by molecular beam epitaxy and potential applications

(3) He, Liang a Kou, Xufeng a Wang, Kang L a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

Molecular beam epitaxy; Thin films; Topological insulators

Indexed keywords

BULK MATERIALS; COMPOUND SEMICONDUCTORS; FUNDAMENTAL STUDIES; GROWTH MECHANISMS; GROWTH PARAMETERS; HIGH QUALITY; LAYERED GROWTH; MATERIAL SYSTEMS; POTENTIAL APPLICATIONS; QUANTUM STRUCTURE; SEMICONDUCTOR HETEROSTRUCTURES; THERMO-ELECTRIC MATERIALS; TOPOLOGICAL INSULATORS;

ANTIMONY COMPOUNDS; BISMUTH COMPOUNDS; ELECTRIC INSULATORS; EPITAXIAL GROWTH; FILM GROWTH; MOLECULAR BEAM EPITAXY; SEMICONDUCTING SELENIUM COMPOUNDS; SEMICONDUCTOR DOPING; SUPERLATTICES; THERMOELECTRICITY; THIN FILMS;

HETEROJUNCTIONS;

EID: 84873658286 PISSN: 18626254 EISSN: 18626270 Source Type: Journal
DOI: 10.1002/pssr.201307003 Document Type: Article

Times cited : (166)

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