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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 4, 2008, Pages 739-744

Process development and material characterization of polycrystalline Bi2 Te3, PbTe, and PbSnSeTe thin films on silicon for millimeter-scale thermoelectric generators

(5) Boniche, I a Morgan, B C b Taylor, P J b Meyer, C D a Arnold, D P a

a UNIVERSITY OF FLORIDA (United States)

b U S ARMY RESEARCH LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

(100) SILICON; DRY-ETCH; FILM ADHESION; FILM RESISTIVITY; GENERATOR APPLICATIONS; MATERIAL CHARACTERIZATIONS; METAL CONTACTS; METALLIZATION; MICRO ELECTRO MECHANICAL SYSTEMS (MEMS); MICROFABRICATION METHODS; OXIDIZED SILICON SUBSTRATES; POLY CRYSTALLINE; POST DEPOSITION; POST DEPOSITION ANNEAL (PDA); POWER DELIVERY; POWER GENERATORS; PROCESS DEVELOPMENTS; SI(2 1 1) SUBSTRATES; SILICON (111) SUBSTRATES; TEST STRUCTURES; THIN FILM METALS; TRANSFER LENGTH METHOD (TLM); VAN DER PAUW; WET-ETCH;

AMORPHOUS MATERIALS; ANNEALING; COMPOSITE MICROMECHANICS; COPPER; DIRECT ENERGY CONVERSION; ELECTRIC POWER TRANSMISSION; ENERGY CONVERSION; EPITAXIAL GROWTH; GOLD; LITHOGRAPHY; METALLIZING; METALS; METHANE; MICROELECTROMECHANICAL DEVICES; NICKEL; NITROGEN; PHOTORESISTS; PLATINUM; PLATINUM METALS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SILICON; SMELTING; SOLIDS; STEEL ANALYSIS; SUBSTRATES; THERMOELECTRIC EQUIPMENT; THERMOELECTRICITY; THICK FILMS; THIN FILMS;

VAPOR DEPOSITION;

EID: 46449096259 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2841522 Document Type: Article

Times cited : (12)

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