메뉴 건너뛰기




Volumn 102, Issue 1, 2013, Pages

Orientation-dependent stress relaxation in hetero-epitaxial 3C-SiC films

Author keywords

[No Author keywords available]

Indexed keywords

3C-SIC FILMS; BIAXIAL STRAINS; CURVATURE MEASUREMENT; EPITAXIAL PROCESS; GROWTH CONDITIONS; GROWTH ORIENTATIONS; RESIDUAL TENSILE STRESS; SI (1 1 1); SI(1 0 0); SIC FILMS; STRESS EVALUATIONS;

EID: 84872345925     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4774087     Document Type: Article
Times cited : (66)

References (26)
  • 2
    • 0031515387 scopus 로고    scopus 로고
    • 10.1002/1521-3951(199707)202:1<335::AID-PSSB335>3.0.CO;2-Y
    • H. Nagasawa and K. Yagi, Phys. Status Solidi B 202, 335 (1997). 10.1002/1521-3951(199707)202:1<335::AID-PSSB335>3.0.CO;2-Y
    • (1997) Phys. Status Solidi B , vol.202 , pp. 335
    • Nagasawa, H.1    Yagi, K.2
  • 7
    • 0026186714 scopus 로고
    • 10.1016/0924-4247(91)85021-F
    • H. Guckel, Sens. Actuators 28, 133 (1991). 10.1016/0924-4247(91)85021-F
    • (1991) Sens. Actuators , vol.28 , pp. 133
    • Guckel, H.1
  • 13
    • 0030081591 scopus 로고    scopus 로고
    • 10.1088/0268-1242/11/2/001
    • I. De Wolf, Semicond. Sci. Technol. 11, 139 (1996). 10.1088/0268-1242/11/ 2/001
    • (1996) Semicond. Sci. Technol. , vol.11 , pp. 139
    • De Wolf, I.1
  • 20
    • 0016974517 scopus 로고
    • 10.1063/1.323119
    • K. Röll, J. Appl. Phys. 47 (7), 3224 (1976). 10.1063/1.323119
    • (1976) J. Appl. Phys. , vol.47 , Issue.7 , pp. 3224
    • Röll, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.