Micro-Raman spectroscopy to study local mechanical stress in silicon integrated circuits

Semiconductor Science and Technology

Volumn 11, Issue 2, 1996, Pages 139-154

  De Wolf, Ingrid ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

MECHANICAL VARIABLES MEASUREMENT; MICROELECTRONIC PROCESSING; RAMAN SPECTROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; STRESSES; SUBSTRATES;

LOCAL OXIDATION STRUCTURES; MECHANICAL STRESS; MICRO-RAMAN SPECTROSCOPY; STRESS MEASUREMENT;

INTEGRATED CIRCUITS;

EID: 0030081591     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/11/2/001     Document Type: Review

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