Low vacuum deposition of aluminum nitride thin films by sputtering

International Journal of Applied Ceramic Technology

Volumn 10, Issue 1, 2013, Pages 51-59

  Yao, Li Ren ^a   Lu, Fu Hsing ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; ALN FILMS; ALUMINUM NITRIDE THIN FILMS; BASE PRESSURE; HIGH VACUUM; LOW VACUUM; LOW VACUUM ENVIRONMENT; MODEL SYSTEM; NITRIDE FILMS; PROCESSING TIME; PROCESSING WINDOWS; RESIDUAL GAS; SPUTTERING DEPOSITION; TECHNOLOGICAL APPLICATIONS;

NITRIDES; THIN FILMS; VACUUM DEPOSITION;

ALUMINUM NITRIDE;

EID: 84872009596     PISSN: 1546542X     EISSN: 17447402     Source Type: Journal    
DOI: 10.1111/j.1744-7402.2012.02790.x     Document Type: Article

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