Oxidation behavior of AlN films at high temperature under controlled atmosphere

Journal of the European Ceramic Society

Volumn 28, Issue 3, 2008, Pages 691-698

  Lin, Chih Yuan ^a   Lu, Fu Hsing ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Al2O3; AlN; Microstructure; Oxidation; Phase changes; Thin films

Indexed keywords

GIBBS FREE ENERGY; MAGNETRON SPUTTERING; MICROSTRUCTURE; OXIDATION; PHASE TRANSITIONS; THERMODYNAMIC STABILITY;

CRYSTALLINE PHASES; NITROGEN/OXYGEN PARTIAL PRESSURE;

ALUMINUM COMPOUNDS;

ALUMINUM COMPOUNDS; GIBBS FREE ENERGY; MAGNETRON SPUTTERING; MICROSTRUCTURE; OXIDATION; PHASE TRANSITIONS; THERMODYNAMIC STABILITY;

EID: 36249004509     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2007.07.015     Document Type: Article

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