Nanomechanical properties of AlN(1 0 3) thin films by nanoindentation

Journal of Alloys and Compounds

Volumn 494, Issue 1-2, 2010, Pages 219-222

  Jian, Sheng Rui ^a   Chen, Guo Ju ^a   Jang, Jason S C ^b   Lai, Yi Shao ^c  

^a I SHOU UNIVERSITY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^c ADVANCED SEMICONDUCTOR ENGINEERING INC   (Taiwan)

Author keywords

AFM; AlN thin films; Hardness; Nanoindentation; XRD

Indexed keywords

AFM; ALN; ALN THIN FILMS; AVERAGE GRAIN SIZE; CRYSTALLINE STRUCTURE; NANOINDENTATION TECHNIQUES; NANOMECHANICAL PROPERTY; RADIO FREQUENCY MAGNETRON SPUTTERING; SI(1 0 0); SPUTTERING POWER; XRD; YOUNG'S MODULUS;

ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; CRYSTALLINE MATERIALS; HARDNESS; MAGNETRON SPUTTERING; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE STRUCTURE; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77649343043     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.11.166     Document Type: Article

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