Investigation of d.c.-reactive magnetron-sputtered AlN thin films by electron microprobe analysis, X-ray photoelectron spectroscopy and polarised infra-red reflection

Surface and Coatings Technology

Volumn 106, Issue 2-3, 1998, Pages 205-208

  Manova, D ^a   Dimitrova, V ^a   Fukarek, W ^b   Karpuzov, D ^c  

^a UNIVERSITY OF RUSE   (Bulgaria)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

AlN; D.c. magnetron sputtering; Electron microprobe analysis; Polarised infra red reflection; X ray photoelectron spectroscopy

Indexed keywords

ALUMINUM COMPOUNDS; CARBON STEEL; CRYSTAL STRUCTURE; LIGHT REFLECTION; MAGNETRON SPUTTERING; MICROANALYSIS; PHONONS; POTASSIUM COMPOUNDS; SILICON WAFERS; SPUTTER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON MICROPROBE ANALYSIS (EPMA); POLARIZED INFRA-RED REFLECTION (PIRR);

DIELECTRIC FILMS;

EID: 0032482857     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00527-1     Document Type: Article

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