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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma

(3) Donmez, Inci a Ozgit Akgun, Cagla a Biyikli, Necmi a

a BILKENT UNIVERSITY (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; CARBON ELEMENTS; GALLIUM OXIDES; LOW-TEMPERATURE DEPOSITION; MONOCLINIC CRYSTAL STRUCTURE; OXYGEN PLASMAS; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; POLYCRYSTALLINE; ROOT MEAN SQUARE ROUGHNESS; TEMPERATURE WINDOW; TRIMETHYL GALLIUM;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; DEPOSITS; OXYGEN; PHOTOELECTRONS; REFRACTIVE INDEX; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84871912181 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.4758782 Document Type: Article

Times cited : (67)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.