SCOPUS 정보 검색 플랫폼

Integrated Ferroelectrics

Volumn 80, Issue 1, 2006, Pages 197-206

Ga2O3 thin film deposited by atomic layer deposition with high plasma power

(6) Shan, F K a Liu, G X a Lee, W J a Lee, G H a Kim, I S a Shin, B C a

a Dong Eui University (South Korea)

Author keywords

Gallium oxide; Plasma enhanced atomic layer deposition (PEALD); Refractive index; Spectroscopic ellipsometry

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITION; DIFFRACTOMETERS; ELECTRIC PROPERTIES; ELLIPSOMETRY; HIGH TEMPERATURE EFFECTS; INSULATION; MORPHOLOGY; PLASMA APPLICATIONS; SPECTROSCOPIC ANALYSIS; THIN FILMS; X RAY APPARATUS;

GALLIUM OXIDE; PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD); PLASMA POWER; SPECTROSCOPIC ELLIPSOMETRY;

GALLIUM COMPOUNDS;

EID: 33745756073 PISSN: 10584587 EISSN: 16078489 Source Type: Conference Proceeding
DOI: 10.1080/10584580600657666 Document Type: Article

Times cited : (23)

References (11)

1
- 0035714050
- W. J. Lee, I. K. You, S. O. Ryu, B. G. Yu, K. I. Cho, S. G. Yoon, and C. S. Lee, Jpn. J. Appl. Phys. 40, 6941 (2001).
- (2001) Jpn. J. Appl. Phys. , vol.40 , pp. 6941
- Lee, W.J.¹ You, I.K.² Ryu, S.O.³ Yu, B.G.⁴ Cho, K.I.⁵ Yoon, S.G.⁶ Lee, C.S.⁷

2
- 15344345163
- W. J. Lee, W. C. Shin, B. G. Chae, S. O. Ryu, I. K. You, S. M. Cho, B. G. Yu, and B. C. Shin, Integr. Ferroelectr. 46, 275 (2002).
- (2002) Integr. Ferroelectr. , vol.46 , pp. 275
- Lee, W.J.¹ Shin, W.C.² Chae, B.G.³ Ryu, S.O.⁴ You, I.K.⁵ Cho, S.M.⁶ Yu, B.G.⁷ Shin, B.C.⁸

3
- 23844468509
- F. K. Shan, G. X. Liu, W. J. Lee, G. H. Lee, I. S. Kim, and B. C. Shin, J. Appl. Phys. 98, 023504 (2005).
- (2005) J. Appl. Phys. , vol.98 , pp. 023504
- Shan, F.K.¹ Liu, G.X.² Lee, W.J.³ Lee, G.H.⁴ Kim, I.S.⁵ Shin, B.C.⁶

4
- 2942618410
- W. C. Shin, S. O. Ryu, I. K. You, B. G. Yu, W. J. Lee, K. J. Choi, and S. G. Yoon, J. Electrochemical Soc. 151, C292 (2004).
- (2004) J. Electrochemical Soc. , vol.151
- Shin, W.C.¹ Ryu, S.O.² You, I.K.³ Yu, B.G.⁴ Lee, W.J.⁵ Choi, K.J.⁶ Yoon, S.G.⁷

5
- 21744453672
- J. J. Park, W. J. Lee, G. H. Lee, I. S. Kim, B. C. Shin, and S. G. Yoon, Integr. Ferroelectr. 68, 129 (2004).
- (2004) Integr. Ferroelectr. , vol.68 , pp. 129
- Park, J.J.¹ Lee, W.J.² Lee, G.H.³ Kim, I.S.⁴ Shin, B.C.⁵ Yoon, S.G.⁶

6
- 0025488482
- M. Fleischer, W. Hanrieder, and H. Meixner, Thin Solid Films 190, 93 (1990).
- (1990) Thin Solid Films , vol.190 , pp. 93
- Fleischer, M.¹ Hanrieder, W.² Meixner, H.³

7
- 0000551578
- M. Orita, H. Ohta, and M. Hirano, Appl. Phys. Lett. 77, 4166 (2000).
- (2000) Appl. Phys. Lett. , vol.77 , pp. 4166
- Orita, M.¹ Ohta, H.² Hirano, M.³

8
- 79956015067
- M. Rebien, W. Henrion, M. Hong, J. P. Mannaerts, and M. Fleischer, Appl. Phys. Lett. 81, 250 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 250
- Rebien, M.¹ Henrion, W.² Hong, M.³ Mannaerts, J.P.⁴ Fleischer, M.⁵

9
- 0000267946
- H. Kim and W. Kim, J. Appl. Phys. 62, 2000 (1987).
- (1987) J. Appl. Phys. , vol.62 , pp. 2000
- Kim, H.¹ Kim, W.²

10
- 0008723743
- A. Ortiz, J. C. Alonso, E. Andrade, and C. Urbiola, J. Electrochemical Soc. 148, F26 (2001).
- (2001) J. Electrochemical Soc. , vol.148
- Ortiz, A.¹ Alonso, J.C.² Andrade, E.³ Urbiola, C.⁴

11
- 0346216006
- M. F. Al-Kuhaili, S. M. A. Durrani, and E. E. Khawaja, Appl. Phys. Lett. 83, 4533 (2003).
- (2003) Appl. Phys. Lett. , vol.83 , pp. 4533
- Al-Kuhaili, M.F.¹ Durrani, S.M.A.² Khawaja, E.E.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.