Chemical vapor deposition of Ga2O3 thin films on Si substrates

Bulletin of the Korean Chemical Society

Volumn 23, Issue 2, 2002, Pages 225-228

  Kim, Doo Hyun ^a   Yoo, Seung Ho ^a   Chung, Taek Mo ^a   An, Ki Seok ^a   Yoo, Hee Soo ^b   Kim, Yunsoo ^a  

^a Korea Research Institute of Chemical Technology   (South Korea)

^b Chungbuk National University   (South Korea)

Author keywords

Gallium isopropoxide; Gallium oxide; Metal organic chemical vapor deposition; Single precursor

Indexed keywords

GALLIUM; SILICON;

ANALYTIC METHOD; ARTICLE; CHEMICAL ANALYSIS; DEVICE; FILM COATING; GAS CHROMATOGRAPHY; PHASE SEPARATION; ROENTGEN SPECTROSCOPY; SEMICONDUCTOR; STOICHIOMETRY; VAPOR;

EID: 0037138940     PISSN: 02532964     EISSN: None     Source Type: Journal    
DOI: 10.5012/bkcs.2002.23.2.225     Document Type: Article

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