The tuned substrate self-bias in a radio-frequency inductively coupled plasma

Plasma Science and Technology

Volumn 6, Issue 6, 2004, Pages 2549-2558

  Ding, Zhenfeng ^a   Huo, Weigang ^a   Wang, Younian ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Capacitive coupling; Inductive coupling; Mode transition; RF plasma

Indexed keywords

CAPACITIVE COUPLING; CIRCUIT PARAMETERS; HYSTERESIS LOOP; INDUCTIVE COUPLING; MODE TRANSITION; RF PLASMA;

CAPACITANCE; ELECTRIC IMPEDANCE; HYSTERESIS; PARAMETER ESTIMATION; PLASMA SHEATHS; SUBSTRATES; TUNING;

INDUCTIVELY COUPLED PLASMA;

EID: 33646431788     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/6/6/007     Document Type: Article

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