Implementing ALD layers in MEMS processing

ECS Transactions

Volumn 11, Issue 7, 2007, Pages 3-14

  Puurunen, R L ^a   Saarilahti, J ^a   Kattelus, H ^a  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; BIOCOMPATIBILITY; DEPOSITS; ELECTROMECHANICAL DEVICES; MEMS; OXIDE MINERALS; TEMPERATURE; TITANIUM DIOXIDE;

BIOCOMPATIBLE COATINGS; ENABLING TECHNOLOGIES; HIGH DIELECTRIC CONSTANTS; INSULATING LAYERS; MICRO ELECTROMECHANICAL SYSTEM (MEMS); PROTECTIVE LAYERS; THERMAL ENVIRONMENT; TITANIUM TETRACHLORIDES;

ATOMIC LAYER DEPOSITION;

EID: 45249115332     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2779063     Document Type: Conference Paper

References (12)

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