Low pressure hydrogen discharges diluted with argon explored using a global model

Plasma Sources Science and Technology

Volumn 19, Issue 6, 2010, Pages

  Hjartarson, A T ^a   Thorsteinsson, E G ^b   Gudmundsson, J T ^b  

^a UNIVERSITY OF ICELAND   (Iceland)

^b SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON DILUTION; DISCHARGE PRESSURES; DISSOCIATION FRACTIONS; DISSOCIATIVE ATTACHMENT; ELECTRON DENSITIES; GLOBAL MODELS; HIGH DENSITY; HYDROGEN DISCHARGE; HYDROGEN MOLECULE; LOW PRESSURES; LOW-PRESSURE HYDROGEN; STEADY STATE; TEMPERATURE DECREASE; VIBRATIONALLY EXCITED;

CHEMICAL BONDS; ELECTRONEGATIVITY; HYDROGEN; PHOTODISSOCIATION; POSITIVE IONS; REACTION RATES;

ARGON;

EID: 78649927737     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/6/065008     Document Type: Article

References (76)

1. Ohara Y 1998 Rev. Sci. Instrum. 69 908
2. Speth E et al 2006 Nucl. Fusion 46 S220
3. Ditizio R A, Liu G, Fonash S J, Hseih B-C and Greve D W 1990 Appl. Phys. Lett. 56 1140
4. Cielaszyk E S, Kirmse K H R, Stewart R A andWendt A E 1995 Appl. Phys. Lett. 67 3099
5. Bernstein J, Qin S, Chan C and King T-J 1996 IEEE Trans. Electron Devices 43 1876
6. Yeh C-F, Chen T-J, Liu C, Gudmundsson J T and Lieberman M A 1999 IEEE Electron Device Lett. 20 223
7. Bacal M, Bruneteau A M, Graham W G, Hamilton G W and Nachman M 1981 J. Appl. Phys. 52 1247
8. Hiskes J R 1991 J. Appl. Phys. 70 3409
9. Hiskes J R 1980 J. Appl. Phys. 51 4592
10. Matveyev A A and Silakov V P 1995 Plasma Sources Sci. Technol. 4 606
11. Graham W G 1995 Plasma Sources Sci. Technol. 4 281
12. Gorse C, Celiberto R, Cacciatore M, Laganá A and Capitelli M 1992 Chem. Phys. 161 211
13. Berlemont P, Skinner D A and Bacal M 1993 Rev. Sci. Instrum. 64 2721
14. Zorat R, Goss J, Boilson D and Vender D 2000 Plasma Sources Sci. Technol. 9 161
15. Zorat R and Vender D 2000 J. Phys. D: Appl. Phys. 33 1728
16. Paunska T, Shivarova A and Tarnev K 2010 J. Appl. Phys. 107 083301
17. Paunska T, Schluter H, Shivarova A and Tarnev K 2006 Phys. Plasmas 13 023504
18. Yazawa H, Tonegawa A, Ono M, Shibuya T and Kawamura K 2006 Japan. J. Appl. Phys. 45 8208
19. Chen C, Wei T, Collins L and Phillips J 1999 J. Phys. D: Appl. Phys. 32 688
20. Kimura T and Kasugai H 2010 J. Appl. Phys. 107 083308
21. Marques L, Jolly J and Alves L L 2007 J. Appl. Phys. 102 063305
22. Kalache B, Novikova T, Morral A, Cabarrocas P, Morscheidt W and Hassouni K 2004 J. Phys. D: Appl. Phys. 37 1765
23. Diomede P, Capitelli M and Longo S 2005 Plasma Sources Sci. Technol. 14 459
24. Gudmundsson J T 1998 Plasma Sources Sci. Technol. 7 330
25. Gudmundsson J T 1999 Plasma Sources Sci. Technol. 8 58
26. Abdel-Rahman M, Schulz-von der Gathen V, Gans T, Niemi K and Döbele H F 2006 Plasma Sources Sci. Technol. 15 620
27. Thorsteinsson E G and Gudmundsson J T 2010 Plasma Sources Sci. Technol. 19 015001
28. Thorsteinsson E G and Gudmundsson J T 2009 Plasma Sources Sci. Technol. 18 045001
29. Lee C, Graves D B, Lieberman M, and Hess D W 1994 J. Electrochem. Soc. 141 1546
30. Patel K K 1998 Master's Thesis University of California at Berkeley Department of Electrical Engineering and Computer Sciences
31. Thorsteinsson E G and Gudmundsson J T 2010 J. Phys. D: Appl. Phys. 43 115201
32. Gudmundsson J T and Thorsteinsson E G 2007 Plasma Sources Sci. Technol. 16 399
33. Yoon J-S, Song M-Y, Han J-M, Hwang S H, Chang W-S, Lee B and Itikawa Y 2008 J. Phys. Chem. Ref. Data 37 913
34. King C C, Trajmar S and McConkey J W 1989 Comment. At. Mol. Phys. 23 229
35. Zecca A, Karwasz G P and Brusa R S 1996 Riv. Nuovo Cimento 19 1
36. Phelps A V 1990 J. Phys. Chem. Ref. Data 19 653
37. Celiberto R, Capitelli M and Laricchiuta A 2002 Phys. Scr. T96 32
38. Brunger M J and Buckman S J 2002 Phys. Rep. 357 215
39. Anicich V G 2003 Technical Report JPL-Publication-03-19, National Aeronautics and Space Administration, Jet Propulsion Laboratory, Pasadena, CA
40. Straub H C, Renault P, Lindsay B G, Smith K A and Stebbings R F 1995 Phys. Rev. A 52 1115
41. Hayashi M 2003 A set of electron-Ar cross sections with 25 excited states http://jilawww.colorado.edu/~avp/collision data/electronneutral/hayashi.txt
42. Shah M B 1987 J. Phys. B: At. Mol. Opt. Phys. 20 3501
43. Horáček J, Čížek M, Houfek K, Kolorenč P and Domcke W 2006 Phys. Rev. A 73 022701
44. Ali M A and Stone P 2008 Int. J. Mass Spectrom. 271 51
45. Mityureva A A and Smirnov V V 2004 Opt. Spectrosc. 97 508
46. Deutsch H, Becker K, Grum-Grzhimailo A N, Bartschat K, Summers H, Probst M, Matt-Leubner S and Märk T D 2004 Int. J. Mass Spectrom. 233 39
47. Ferreira C M, Loureiro J and Richard A 1985 J. Appl. Phys. 57 82
48. Bassett N L and Economou D J 1994 J. Appl. Phys. 75 1931
49. Kannari F, Obara M and Fujioka T 1985 J. Appl. Phys. 57 4309
50. Hurst G S, Wagner E B and Payne M G 1974 J. Chem. Phys. 61 3680
51. Ashida S, Lee C and Lieberman M A 1995 J. Vac. Sci. Technol. A 13 2498
52. Lee M-H, Jang S-H and Chung C-W 2006 Phys. Plasmas 13 053502
53. Albritton D L 1978 At. Data Nucl. Data Tables 22 1
54. Bogaerts A and Gijbels R 2002 Spectrochim. Acta Part B: At. Spectrosc. 57 1071
55. Beuthe T G and Chang J-S 1999 Japan. J. Appl. Phys. 38 4576
56. Phelps A V 1992 J. Phys. Chem. Ref. Data 21 883
57. Horáček J, Čížek M, Houfek K, Koloren P and Domcke W 2004 Phys. Rev. A 70 052712
58. Tawara H, Itikawa Y, Nishimura H and Yoshino M 1990 J. Phys. Chem. Ref. Data 19 617
59. Eerden M J J, van de Sanden M C M, Otorbaev D K and Schram D C 1995 Phys. Rev. A 51 3362
60. Peart B, Walton D S and Dolder K T 1970 J. Phys. B: At. Mol. Opt. Phys. 3 1346
61. Gerlich D and Horning S 1992 Chem. Rev. 92 1509
62. Florescu-Mitchell A I and Mitchell J B A 2006 Phys. Rep. 430 277
63. Lieberman M A and Gottscho R A 1994 Physics of Thin Films vol 18 edited by M Francombe and J Vossen (New York: Academic) pp 1-119
64. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
65. Fabrikant I, Wadehra J and Xu Y 2002 Phys. Scr. T96 45
66. Gao H 1992 Phys. Rev. A 45 6895
67. Capitelli M and Gorse C 2005 IEEE Trans. Plasma Sci. 33 1832
68. Lee C and Lieberman M A 1995 J. Vac. Sci. Technol. A 13 368
69. Kim S, Lieberman M A, Lichtenberg A J and Gudmundsson J T 2006 J. Vac. Sci. Technol. A 24 2025
70. Curley G A, Gatilova L, Guilet S, Bouchoule S, Gogna G S, Sirse N, Karkari S and Booth J P 2010 J. Vac. Sci. Technol. A 28 360
71. Eenshuistra P J, Heeren R M A, Kleyn A W and Hopman H J 1989 Phys. Rev. A 40 3613
72. Gorse C, Capitelli M, Bacal M, Bretagne J and Laganá A 1987 Chem. Phys. 117 177
73. Jolly J and Booth J-P 2005 J. Appl. Phys. 97 103305
74. Tserepi A D, Dunlop J R, Preppernau B L and Miller T A 1992 J. Vac. Sci. Technol. A 10 1188
75. Gudmundsson J T 2001 Plasma Sources Sci. Technol. 10 76
76. Longo S, Diomede P and Capitelli M 2008 Phys. Scr. 78 058107