One step synthesis of pure cubic and monoclinic HfO2 nanoparticles: Correlating the structure to the electronic properties of the two polymorphs

Journal of Applied Physics

Volumn 112, Issue 10, 2012, Pages

  Rauwel, P ^a   Rauwel, E ^a   Persson, C ^a   Sunding, M F ^a   Galeckas, A ^a  

^a UNIVERSITY OF OSLO   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE SIZE; BANDGAP STATE; CHEMICAL COMPOSITIONS; EQUIVALENT CONDITION; FIRST-PRINCIPLES CALCULATION; HAFNIUM DIOXIDE; MICRO-ELECTRONIC DEVICES; MONOCLINIC HFO; NANO-SIZE; ONE STEP SYNTHESIS; ONE-POT SYNTHESIS; VISIBLE PHOTOLUMINESCENCE; WIDE BAND GAP;

DENSITY FUNCTIONAL THEORY; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; ENERGY GAP; HAFNIUM; NANOPARTICLES; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

HAFNIUM OXIDES;

EID: 84870713964     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4766272     Document Type: Article

References (42)

1. P. R. Solanki, A. Kaushik, V. V. Agrawal, and B. D. Malhotra, NPG Asia Mater. 3, 17-24 (2011). 10.1038/asiamat.2010.137
2. W. C. Chueh, C. Falter, M. Abbott, D. Scipio, P. Furler, S. M. Haile, and A. Steinfeld, Science 330, 1797-1801 (2010). 10.1126/science.1197834
3. R. Ramesh and N. A. Spaldin, Nature Mater. 6, 21-29 (2007). 10.1038/nmat1805
4. A. S. Arico, P. Bruce, B. Scrosati, J.-M. Tarascon, and W. van Schalkwijk, Nature Mater. 4, 366-377 (2005). 10.1038/nmat1368
5. C. H. Ahn, K. M. Rabe, and J.-M. Triscone, Science 303, 488 (2004). 10.1126/science.1092508
6. J. M. D. Coey, M. Viret, and S. von Molnar, Adv. Phys. 48, 167 (1999). 10.1080/000187399243455
7. Y. Wang, T. Wu, Y. Kanamori, and K. Hane, Nanoscale Res. Lett. 6, 367 (2011). 10.1186/1556-276X-6-367
8. A. I. Rusanov, Surf. Sci. Rep. 58, 111-239 (2005). 10.1016/j.surfrep. 2005.08.002
9. X. Zhu, J. Zhu, A. Li, Z. Liu, and N. Ming, J. Mater. Sci. Technol. 25 (3), 289-313 (2009).
10. J.-P. Locquet, C. Marchiori, M. Sousa, J. Fompeyrine, and J. W. Seo, J. Appl. Phys. 100, 051610 (2006). 10.1063/1.2336996
11. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243-5275 (2001). 10.1063/1.1361065
12. J. Robertson, Rep. Prog. Phys. 69, 327-396 (2006). 10.1088/0034-4885/69/ 2/R02
13. See http://www.nytimes.com/2007/01/27/technology/27chip.html and http://www.intel.com/technology/itj/2008/v12i2/6-reliability/8-references.htm for for information on integration of hafnium element in transistors.
14. X. Zhao and D. Vanderbilt, Phys. Rev. B 65, 233106 (2002). 10.1103/PhysRevB.65.233106
15. G.-M. Rignanese, J. Phys.: Condens. Matter 17, R357 (2005). 10.1088/0953-8984/17/7/R03
16. I. A. El-Shanshoury, V. A. Rudenko, and I. A. Ibrahim, J. Am. Ceram. Soc. 53, 264-268 (1970). 10.1111/j.1151-2916.1970.tb12090.x
17. C. E. Curtis, L. M. Doney, and J. R. Johnson, J. Am. Ceram. Soc. 37, 458-465 (1954). 10.1111/j.1151-2916.1954.tb13977.x
18. J. Wang, H. P. Li, and R. Stevens, J. Mater. Sci. 27, 5397-5430 (1992). 10.1007/BF00541601
19. E. Rauwel, F. Ducroquet, M. D. Rossell, J. Verbeeck, G. Van Tendeloo, B. Hollaender, S. Rushworth, and C. Dubourdieu, ECS Trans. 1, 249-256 (2006). 10.1149/1.2209274
20. C. Dubourdieu, E. Rauwel, H. Roussel, F. Ducroquet, B. Hollaender, M. D. Rossell, G. Van Tendeloo, and S. Rushworth, J. Vac. Sci. Technol. A 27, 503 (2009). 10.1116/1.3106627
21. K. Kita, K. Kyuno, and A. Toriumi, Appl. Phys. Lett. 86, 102906-3 (2005). 10.1063/1.1880436
22. C.-H. Lu, J. M. Raitano, S. Khalid, L. Zhang, and S.-W. Chan, J. Appl. Phys. 103, 124303-7 (2008). 10.1063/1.2936983
23. M. Niederberger and N. Pinna, Metal Oxide Nanoparticles in Organic Solvents: Synthesis, Formation, Assembly and Application (Springer, 2009).
24. A. Vioux, Chem. Mater. 9, 2292 (1997). 10.1021/cm970322a
25. K. Tomida, K. Kita, and A. Toriumi, Appl. Phys. Lett. 89, 142902-3 (2006). 10.1063/1.2355471
26. M. Yang, H. Baik, V. Ivanovskaya, C. Colliex, and A. Benayad, J. Appl. Phys. 109, 053723-6 (2011). 10.1063/1.3553410
27. P. Blaha, K. Schwarz, G. K. H. Madsen, D. Kvasnicka, and J. Luitz, in WIEN2k, edited by, K. Schwarz, (Austria, 2001).
28. C. Persson, C. L. Dong, L. Vayssieres, A. Augustsson, T. Schmitt, M. Mattesini, R. Ahuja, J. Nordgren, C. L. Chang, A. Ferreira da Silva, and J.-H. Guo, Microelectron. J. 37, 686 (2006). 10.1016/j.mejo.2005.12.009
29. W. Setyawan, R. M. Gaume, S. Lam, R. S. Feigelson, and S. Curtarolo, ACS Comb. Sci. 13, 382-390 (2011). 10.1021/co200012w
30. A. S. Foster, F. Lopez Gejo, A. L. Shluger, and R. M. Nieminen, Phys. Rev. B 65, 174117 (2002). 10.1103/PhysRevB.65.174117
31. E. Rauwel, A. Galeckas, P. Rauwel, M. F. Sunding, and H. Fjellvåg, J. Phys. Chem. C 115, 25227-25233 (2011). 10.1021/jp208487v
32. E. Rauwel, A. Galeckas, P. Rauwel, and H. Fjellvåg, Adv. Funct. Mater. 22, 1174-1179 (2012). 10.1002/adfm.201101013
33. J. Ni, Q. Zhou, Z. Li, and Z. Zhang, Appl. Phys. Lett. 93, 011905-3 (2008). 10.1063/1.2952288
34. G.-S. Yi and G.-M. Chow, Chem. Mater. 19, 341-343 (2006). 10.1021/cm062447y
35. H. Jiang, R. I. Gomez-Abal, P. Rinke, and M. Scheffler, Phys. Rev. B 81, 085119 (2010). 10.1103/PhysRevB.81.085119
36. T. Mizoguchi, M. Saitoh, and Y. Ikuhara, J. Phys.: Condens. Matter 21, 104212 (2009). 10.1088/0953-8984/21/10/104212
37. D. Briggs and J. T. Grant, in Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy, edited by, I. Chichester, (Springer, 2003), pp. 31-56.
38. D. D. Sarma and C. N. R. Rao, J. Electron Spectrosc. Relat. Phenom. 20, 25-45 (1980). 10.1016/0368-2048(80)85003-1
39. C. D. Wagner and G. E. Muilenberg, Handbook of X-Ray Photoelectron Spectroscopy: A Reference Book of Standard Data for Use in X-Ray Photoelectron Spectroscopy (Perkin Elmer Corporation (Physical Electronics), Eden Prairie, 1979).
40. 2 and HfO2., in Defects in High-k Gate Dielectric Stacks, edited by, Gusev Evgeni, (Springer, Dordrecht, 2006), Vol. 220.
41. D. W. McComb, A. J. Craven, D. A. Hamilton, and M. MacKenzie, Appl. Phys. Lett. 84, 4523-4525 (2004). 10.1063/1.1758303
42. See supplementary material at http://dx.doi.org/10.1063/1.4766272 E-JAPIAU-112-052222 for TGA curves, size distribution histograms and XPS survey scan.