Freestanding HfO 2 grating fabricated by fast atom beam etching

Nanoscale Research Letters

Volumn 6, Issue , 2011, Pages 1-5

  Wang, Yongjin ^a,b   Wu, Tong ^b   Kanamori, Yoshiaki ^b   Hane, Kazuhiro ^b  

^a NANJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Fast atom beam etching; HfO 2 film grating

Indexed keywords

DIELECTRIC REFLECTORS; ELECTRON BEAM EVAPORATORS; FAST ATOM BEAMS; GRATING PATTERNS; GRATING REGION; HFO 2 FILM GRATING; OPTICAL RESPONSE; REFLECTANCE MEASUREMENTS; SILICON SUBSTRATES; SINGLE LAYER;

ATOMS; ELECTRON BEAMS; FABRICATION; HAFNIUM OXIDES; REFLECTION;

DRY ETCHING;

EID: 84862971401     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-367     Document Type: Article

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