Probing local coordination environments in high-k materials for gate stack applications

Applied Physics Letters

Volumn 84, Issue 22, 2004, Pages 4523-4525

  McComb, D W ^a   Craven, A J ^b   Hamilton, D A ^b   MacKenzie, M ^b  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; COMPOSITE MATERIALS; CRYSTAL ATOMIC STRUCTURE; CRYSTALLIZATION; DATA ACQUISITION; DEPOSITION; ELECTRONIC STRUCTURE; ENERGY DISSIPATION; POWDERS; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

BOND LENGTHS; CRYSTALLINE STANDARDS; ENERGY-LOSS NEAR-EDGE STRUCTURE (ELNES); LIGANDS;

AMORPHOUS MATERIALS;

EID: 3042786249     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1758303     Document Type: Article

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