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Volumn 1, Issue 5, 2006, Pages 249-256
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Y-doped HfO2 thin films grown by injection-MOCVD
a a b c c c d e |
Author keywords
[No Author keywords available]
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Indexed keywords
DOPING (ADDITIVES);
HAFNIUM COMPOUNDS;
INFRARED SPECTROSCOPY;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MICROELECTRONICS;
PERMITTIVITY;
X RAY DIFFRACTION;
YTTRIUM;
GATE OXIDES;
RUTHERFORD BACKSCATTERING SPECTROMETRY;
X RAY REFLECTOMETRY;
THIN FILMS;
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EID: 33845267742
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.2209274 Document Type: Conference Paper |
Times cited : (3)
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References (12)
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