Quantifying the low-energy limit and spectral resolution in valence electron energy loss spectroscopy

Ultramicroscopy

Volumn 124, Issue , 2013, Pages 130-138

  Aguiar, Jeffery A ^a,b   Reed, Bryan W ^b   Ramasse, Quentin M ^c   Erni, Rolf ^d   Browning, Nigel D ^a,e,f  

^a University of California Davis   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c SUPERSTEM LABORATORY   (United Kingdom)

^d SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^e UNIVERSITY OF CALIFORNIA   (United States)

^f PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

Electron energy loss spectroscopy; Peak deconvolution; Peak subtraction; Retardation effects; S TEM; Silicon; Surface effects; VEELS

Indexed keywords

PEAK SUBTRACTION; PEAK-DECONVOLUTION; RETARDATION EFFECT; S/TEM; SURFACE EFFECT; VEELS;

BENCHMARKING; CURVE FITTING; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; MICROSCOPES; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

PROCESSING;

SILICON;

ARTICLE; CONTROLLED STUDY; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPE; ENERGY; IMAGE ANALYSIS; IMAGE PROCESSING; IMAGE QUALITY; INTERMETHOD COMPARISON; QUANTITATIVE ANALYSIS; THICKNESS; ALGORITHM; LIMIT OF DETECTION; MATHEMATICAL MODEL; NONLINEAR SYSTEM; PROCESS DEVELOPMENT; PROCESS OPTIMIZATION; QUALITY CONTROL; RICHARDSON LUCY PEAK DECONVOLUTION; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SIGNAL NOISE RATIO; ARTIFACT; CHEMISTRY; METHODOLOGY;

ARTIFACTS; MICROSCOPY, ELECTRON, SCANNING TRANSMISSION; SILICON; SPECTROSCOPY, ELECTRON ENERGY-LOSS;

EID: 84870314920     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2012.08.010     Document Type: Article

References (64)

1. Erni R., Lazar S., Browning N.D. Prospects for analyzing the electronic properties in nanoscale systems by VEELS. Ultramicroscopy 2008, 108:270-276.
2. Egerton R.F. Electron Energy-Loss Spectroscopy in the Electron Microscope 2011, Springer, New York. third ed.
3. Lazar S., Botton G.A., Wu M.-Y., Tichelaar F.D., Zandbergen H.W. Materials science applications of HREELS in near edge structure analysis and low-energy loss spectroscopy. Ultramicroscopy 2003, 96:535-546.
4. Rafferty B., Pennycook S.J., Brown L.M. Zero loss peak deconvolution for bandgap EEL spectra. Journal of Electron Microscopy 2000, 49:517-524.
5. Krivanek O., Ursan J.P., Bacon N.J., Corbin G.J., Dellby N., Hrncirik P.H., Murfitt M.F., Own C.S., Szilagyi Z.S. High-energy-resolution monochromator for aberration-corrected scanning transmission electron microscopy/electron energy-loss spectroscopy. Philosophical Transactions of the Royal Society A 2009, 367:3683-3697.
6. Stöger-Pollach M., Schattschneider P. The influence of relativistic energy losses on bandgap determination using valence EELS. Ultramicroscopy 2007, 107:1178-1185.
7. Press W.H., Teukolsky S.A., Vetterling W.T., Flannery B.P. Numerical Recipes 1986, Cambridge University Press, New York.
8. Gull S.F., Skilling J. Maximum entropy method in image processing. IEE Proceedings F 1984, 131(F):646.
9. Skilling J. Maximum Entropy and Bayesian Methods 1988, Kluwer Academic Publishers, Dordrecht.
10. Werner W.S.M. Differential surface and volume excitation probability of medium-energy electrons in solids. Physical Review B 2006, 74:075421.
11. Tiemeijer P.C., Bischoff M., Freitag B., Kisielowski C. Using a monochromator to improve the resolution in TEM to below 0.5Å Part 1: creating highly coherent monochromated illumination. Ultramicroscopy 2012, 114:72-81.
12. Terauchi M., Tanaka M., Tsuno K., Ishida M. Development of a high energy resolution electron energy-loss spectroscopy microscope. Journal of Microscopy 1999, 194:203-209.
13. Mook H.W., Kruit P. Construction and characterization of the fringe field monochromator for a field emission gun. Ultramicroscopy 2000, 81:129-139.
14. F. Kahl, H. Rose, Outline of an electron monochromator with small Boersch effect, in: Proceedings of the 14th International Congress on Electron Microscopy ICEM 14, Cancun, Mexico, Institute of Physics Publishers, Bristol, Philadelphia, vol. 1, 1998, pp. 71-72.
15. Martinez G., Tsuno K. Design of Wien filters with high resolution. Ultramicroscopy 2004, 100:105-114.
16. Walther T., Quandt E., Stegmann H., Thesen A., Benner G. First experimental test of a new monochromated and aberration-corrected 200kV field-emission scanning transmission electron microscope. Ultramicroscopy 2006, 106:963-969.
17. Bosman M., Keast V.J. Optimizing EELS acquisition. Ultramicroscopy 2008, 109.
18. Kimoto K., Matsui Y. Software techniques for EELS to realize about 0.3eV energy resolution using 300kV FEG-TEM. Journal of Microscopy 2002, 208:224-228.
19. Kimoto K., Kothleitner G., Grogger W., Matsui Y., Hofer F. Advantages of a monochromator for bandgap measurements using electron energy-loss spectroscopy. Micron 2005, 36:185-189.
20. Erni R., Browning N.D. The impact of surface and retardation losses on valence electron energy-loss spectroscopy. Ultramicroscopy 2008, 108:84-99.
21. Erni R., Browning N.D. Valence electron energy-loss spectroscopy in monochromated scanning transmission electron microscopy. Ultramicroscopy 2005, 104:176-192.
22. Reed B.W., Sarikaya S. Background subtraction for low-loss transmission electron energy-loss spectroscopy. Ultramicroscopy 2002, 93:25-37.
23. Ishizuka K., Kimoto K., Bando Y. Improving energy resolution of EELS spectra by deconvolution using maximum-entropy and Richardson-Lucy algorithms. Microscopy and Microanalysis 2003, 9(Suppl. 2):832-833.
24. Wang F., Egerton R.F., Malac M., McLeod R.A., Moreno M.S. The spatial resolution of electron energy-loss and x-ray absorption fine structure. Journal of Applied Physics 2008, 104:034906.
25. Gloter A., Douiri A., Tence M., Colliex C. Improving energy resolution of EELS spectra: an alternative to the monochromator solution. Ultramicroscopy 2003, 96:385-400.
26. Batson P.E., Johnson D.W., Spence J.C.H. Resolution enhancement by deconvolution using a field emission source in electron energy loss spectroscopy. Ultramicroscopy 1992, 41:137-145.
27. Wang Y. Multiple scattering correction by a direct convolution method for electron energy loss spectrum. Ultramicroscopy 1990, 33:151-157.
28. Johnson D.W. A Fourier series method for numerical Kramers-Kronig analysis. Journal of Physics A: Mathematical and General 1975, 8:490-495.
29. Wang F., Egerton R.F., Malac M. Fourier-ratio deconvolution techniques for electron energy-loss spectroscopy (EELS). Ultramicroscopy 2009, 109:1245-1249.
30. Hummel S., Gross A., Werner W.S.M. Richardson-Lucy deconvolution of reflection electron energy loss spectra. Journal of Surface and Interface Analysis 2009, 41:357-360.
31. Lucy L.B. An iterative technique for the rectification of observed distributions. Astronomical Journal 1974, 79:745-754.
32. Overwijk M.H.F., Reefman D. Maximum-entropy deconvolution applied to electron energy-loss spectroscopy. Micron 2000, 31:325-331.
33. Bi H., Borner G. When does the Richardson-Lucy deconvolution converge. Astronomy and Astrophysics Supplement Series 1994, 108:409-415.
34. Egerton R.F. A revised expression for signal/noise ratio in EELS. Ultramicroscopy 1982, 9:387-390.
35. Lazar S., Botton G.A., Zandbergen H.W. Enhancement of resolution in core-loss and low-loss spectroscopy in a monochromated microscope. Ultramicroscopy 2006, 106:1091-1103.
36. Sze S.M., Kwok K.N. Physics of Semiconductor Devices 2006, John Wiley and Sons, New Jersey. third ed.
37. Manchanda L., Storz R.H., Yan R.H., Lee K.F., Westerwick E.H. Clear observation of sub-band gap impact ionization at room temperature and below in 0.1um Si MOSFETs. IEDM Technical Digest 1992, 994-996.
38. M.V. Fischetti, S.E. Laux, Monte Carlo study of sub-band-gap impact ionization in small silicon field-effect transistors, IBM Research Report RC, 1995, p. 20203.
39. Gu L., Srot V., Sigle W., Koch C., van Aken P., Scholz F., Thapa S.B., Kirchner C., Jetter M., Rühle M. Band-gap measurements of direct and indirect semiconductors using monochromated electrons. Physical Review B 2007, 75:195214.
40. 3 by electron beam irradiation. Ultramicroscopy 2011, 111:860-864.
41. Rossouw D., Botton G.A. Resonant optical excitations in complementary plasmonic nanostructures. Optics Express 2012, 20(7):6968-6973.
42. Rossouw D., Couillard M., Vickery J., Kumacheva E., Botton G.A. Multipolar plasmonic resonances in silver nanowire antennas imaged with a subnanometer electron probe. Nano Letters 2011, 11(4):1499-1504.
43. Midgley P.A. A simple new method to obtain high annular w-q patterns. Ultramicroscopy 1999, 76(3):91-96.
44. Kohno H., Mabuchi T., Takeda S., Kohyama M., Terauchi M., Tanaka M. Dielectric properties of extended defects in silicon studied by high-resolution transmission EELSJ. Journal of Electron Microscopy 1998, 47(4):311-317.
45. Bolton J.P.R., Chen M. Electron energy loss in multilayered slabs: I. Normal incidence. Journal of Physics: Condensed Matter 1995, 7:3373-3387.
46. Bolton J.P.R., Chen M. Electron energy loss in multilayered slabs: II. Parallel incidence. Journal of Physics: Condensed Matter 1995, 7:3389-3403.
47. Bolton J.P.R., Chen M. Electron energy loss in multilayered slabs: III. Anisotropic media. Journal of Physics: Condensed Matter 1995, 7:3405-3419.
48. Botton G., L'Esperance G. Effect of accelerating voltage and thickness on effective signal-to-noise ratio in electron energy loss spectroscopy. Ultramicroscopy 1992, 41:287-290.
49. Chen C.H., Silcox J. Detection of optical surface guided modes in thin graphite films by high-energy electron scattering. Physical Review Letters 1975, 35:390-393.
50. Wagner L.F., Spicer W.E. Observation of a band of silicon surface states containing one electron per surface atom. Physical Review Letters 1972, 28(21):1381-1384.
51. Malis T., Cheng S.C., Egerton R.F. EELS log-ratio technique for specimen-thickness measurement in the TEM. Journal of Electron Microscopy Technique 1998, 8:193-200.
52. Reichelt R., Engel A. Monte Carlo calculations of elastic and inelastic electron scattering in biological and plastic materials. Ultramicroscopy 1984, 13:279-293.
53. Engel A. Molecular weight determination by scanning transmission electron microscopy. Ultramicroscopy 1978, 3:273-281.
54. Feja B., Durrenberger M., Muller S.A., Reichelt R., Aebi U. Mass determination by inelastic electron scattering in an energy-filtering transmission electron microscope with slow-scan ccd camera. Journal of Structural Biology 1997, 119:72-82.
55. Howie A. Inelastic scattering by crystal I. The theory of small angle inelastic scattering. Proceedings of the Royal Society of London, Series A: Mathematical and Physical Sciences 1963, 271:268-287.
56. Tougaard S., Sigmund P. Influence of elastic and inelastic scattering on energy spectra. Physical Review B 1982, 25:4452-4466.
57. Reimer L., Rennekamp R. Imaging and recording of mutiple scattering effects by angular-resolved electron energy-loss spectroscopy. Ultramicroscopy 1998, 28:258-265.
58. Goodman P., Moodie A.F. Numerical evaluation of N-beam wave functions in electron scattering. Acta Crystallographica A 1974, 30:280-290.
59. Ding Z.-J., Shimizu R. A Monte Carlo modeling of electron interaction with solids including cascade secondary electron production. Scanning 1996, 18:92-113.
60. Hovington P., Drouin D., Gauvin R. CASINO: A New Monte Carlo code in C language for electron beam interaction-Part I: description of the program. Scanning 1997, 19:1-14.
61. Joy D.C. Monte Carlo Modeling for Electron Microscopy and Microanalysis 1995, Oxford University Press, New York.
62. Egerton R.F. Limits to the spatial, energy and momentum resolution of electron energy-loss spectroscopy. Ultramicroscopy 2007, 107:575-586.
63. Oxley M.P., Cosgriff E.C., Allen L.J. Nonlocality in imaging. Physical Review Letters 2005, 94:203906.
64. Osma J., Garcia de Abajo F.J. Surface effects in the energy loss of ions passing through a thin foil. Physical Review A 1997, 56(3):2032-2040.