Design of Wien filters with high resolution

Ultramicroscopy

Volumn 100, Issue 1-2, 2004, Pages 105-114

  Martinez G ^a   Tsuno, K ^b  

^a UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^b JEOL LTD   (Japan)

Author keywords

07.78.+s; 31,32; 41.85.Gy; 41.85.Si; Aberration correction; Electron trajectory; Field calculation; Wien filter

Indexed keywords

ABERRATIONS; BOUNDARY ELEMENT METHOD; ELECTRIC FIELD EFFECTS; MAGNETIC FIELD EFFECTS; OPTICAL FILTERS; RAY TRACING;

HIGH ENERGY RESOLUTION DEVICES; WIEN FILTERS;

MICROSCOPIC EXAMINATION;

ACCURACY; ANALYTIC METHOD; ARTICLE; ELECTRIC FIELD; FILTER; GEOMETRY; MAGNETIC FIELD; POLARIZATION;

ARTIFACTS; MICROSCOPY, ELECTRON; MODELS, THEORETICAL;

EID: 18144451780     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2004.03.001     Document Type: Article

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