EELS log‐ratio technique for specimen‐thickness measurement in the TEM

Journal of Electron Microscopy Technique

Volumn 8, Issue 2, 1988, Pages 193-200

  Malis, T ^a   Cheng, S C ^b   Egerton, R F ^b,c  

^a Physical Metallurgy Research Labs ^*  (Canada)

^b UNIVERSITY OF ALBERTA   (Canada)

^c STONY BROOK UNIVERSITY   (United States)

Author keywords

Electron energy loss spectroscopy (EELS); Inelastic mean free path; Thickness measurement

Indexed keywords

ARTICLE; ELECTRON MICROSCOPY; MATHEMATICS; METHODOLOGY; MICROTOMY;

MATHEMATICS; MICROSCOPY, ELECTRON; MICROTOMY;

EID: 0023964473     PISSN: 07410581     EISSN: 15530817     Source Type: Journal    
DOI: 10.1002/jemt.1060080206     Document Type: Article

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