Dynamics and Electronegativity of Oxygen RF Plasmas

Contributions to Plasma Physics

Volumn 52, Issue 10, 2012, Pages 836-846

  Kullig C ^a   Dittmann, K ^a   Wegner, W ^a   Sheykin, I ^b   Matyash, K ^a   Loffhagen, D ^b   Schneider, R ^a   Meichsner, J ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

Author keywords

Electron and negative ion density; Low pressure rf discharge; Oxygen plasma; Plasma instability

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL BONDS; ELECTRIC DISCHARGES; ELECTRON DENSITY MEASUREMENT; ELECTRONEGATIVITY; GAUSSIAN BEAMS; INTERFEROMETRY; MAGNETOHYDRODYNAMICS; NEGATIVE IONS; OPTICAL EMISSION SPECTROSCOPY; OXYGEN; PLASMA DIAGNOSTICS; PLASMA STABILITY;

ELECTRON AND NEGATIVE ION DENSITY; ION DENSITY; LOW PRESSURE RF DISCHARGE; LOW PRESSURES; MICROWAVE INTERFEROMETRIES; OXYGEN PLASMAS; PLASMAS: INSTABILITY; RF DISCHARGE; RF PLASMA; RF POWER;

ELECTRONS;

EID: 84869012283     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.201200048     Document Type: Article

References (43)

1. E. Stoffels, W. W. Stoffels, and G. M. W. Kroesen, Plasma Sources Sci. Technol. 10, 311-317 (2001).
2. C. Küllig, K. Dittmann, and J. Meichsner, Plasma Sources Sci. Technol. 19, 065011 (2010).
3. K. Dittmann, K. Matyash, S. Nemschokmichal, J. Meichsner, and R. Schneider, Contrib. Plasma Phys. 50, 942-953 (2010).
4. H.-M. Katsch, A. Goehlich, T. Kawetzki, E. Quandt, and H.-F. Döbele, Appl. Phys. Lett. 75, 2023-2025 (1999).
5. C. Küllig, K. Dittmann and J. Meichsner, IEEE Trans. Plasma Science 39, 2564 (2011).
6. N. St. J. Braithwaite and J. E. Allen, J. Phys. D: Appl. Phys. 21, 1733-1737 (1988).
7. R. L. F. Boyd and J. B. Thompson, Proc. R. Soc. Lond. A 252, 12 (1959).
8. Ch. Hollenstein, W. Schwarzenbach, A. A. Howling, C. Courteille, J. L. Dorier, and L. Sansonnens, J. Vac. Sci. Technol. A 14, 535 (1996).
9. U. Kogelschatz, Plasma Sources Sci. Technol. 11, A1-A6 (2002).
10. G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, and A. Fridman, Plasma Process. Polym. 5, 503-533 (2008).
11. F. X. Bronold, K. Matyash, D. Tskhakaya, R. Schneider, and H. Fehske, J. Phys. D: Applied Physics 40, 6583 (2007).
12. M. M. Becker, D. Loffhagen, and W. Schmidt, Comput. Phys. Commun. 180, 1230-1241 (2009).
13. W. L. Nighan and W. J. WiegPhys. Rev. A 10, 922-945 (1974).
14. K. Dittmann, C. Küllig, and J. Meichsner, Plasma Sources Sci. Technol. 21, 024001 (2012).
15. U. Flenders, B. H. Nguyen Thi, K. Wiesemann, N. A. Khromov, and N. B. Kolokolov, Plasma Sources Sci. Technol. 5, 61-69 (1996).
16. K. Dittmann, D. Drozdov, B. Krames, and J. Meichsner, J. Phys. D: Appl. Phys. 40, 6593-6600 (2007).
17. J. Schulze, A. Derzsi, K. Dittmann, T. Hemke, J. Meichsner, and Z. Donko, Phys. Rev. Lett. 107, 275001 (2011).
18. G. J. M. Hagelaar and L. C. Pitchford, Plasma Sources Sci. Technol. 14, 722-733 (2005).
19. B. Eliasson and U. Kogelschatz, Basic data for modelling of electrical discharges in gases: oxygen, Tech. rep., Brown Boveri Forschungszentrum CH-5405 Baden, 1986.
20. M. Hayashi, Electron collision cross sections, in: Plasma Material Science Handbook, edited by Japan Society for the Promotion of Science (Ohmsha, Ltd, Tokyo, 1992), pp. 748-766.
21. A. V. Phelps, http://jilawww.colorado.edu/∼avp/.
22. H. Leyh, D. Loffhagen, and R. Winkler, Comput. Phys. Commun. 113, 33-48 (1998).
23. G. J. M. Hagelaar, F. J. de Hoog G. M. W. Kroesen, Phys. Rev. E 62, 1452-1454 (2000).
24. W. J. M. Brok, J. van Dijk, M. D. Bowden, J. J. A. M. van der Mullen, and G. M. W. Kroesen, J. Phys. D: Appl. Phys. 36, 1967-1979 (2003).
25. V. E. Golant, A. P. Zhilinsky, and I. E. Sakharov, Fundamentals of Plasma Physics (John Wiley, New York, 1980).
26. J. H. Parker, Phys. Rev. 93, 1148-1156 (1954).
27. M. J. Druyvesteyn, Zeitschrift für Physik A Hadrons and Nuclei 64, 781-798 (1930).
28. A. A. Sonin, AIAA Journal 4, 1588-1596 (1966).
29. S. Klagge and M. Tichý, Czech. J. Phys. 35, 988-1006 (1985).
30. P. A. Miller, G. A. Hebner, K. E. Greenberg, and P. D. Pachan, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995).
31. C. Pargmann, S. V. Singh, and H. Soltwisch, Rev. Sci. Instrum. 76, 113506 (2005).
32. F. Mackel, P. Kempkes, H. Stein, J. Tenfelde, and H. Soltwisch, Meas. Sci. Technol. 22 (2011) 055705 (11pp), doi:10. 1088/0957-0233/22/5/055705.
33. C. Deline, B. E. Gilchrist, C. Dobson, J. E. Jones, and D. G. Chavers, Rev. Sci. Instrum. 78, 113504 (2007); doi: 10.1063/1.2813885.
34. A. El Saghir and S. Shannon, Plasma Sources Sci. Technol. 21, 025003 (2012).
35. C. Küllig, K. Dittmann, and J. Meichsner, Phys. Plasmas 19, 073517 (2012).
36. M. Geigl, S. Peters, O. Gabriel, B. Krames, and J. Meichsner, Contrib. Plasma Phys. 45, 369-377 (2005).
37. A. Goehlich, T. Kawetzki, and H. F. Döbele, J. Chem. Phys. 108, 9362-9370 (1998).
38. H. M. Katsch, A. Tewes, E. Quandt, A. Goehlich, T. Kawetzki, and H. F. Döbele, J. App. Phys. 88, 6232-6238 (2000).
39. S. G. Belostotsky, D. J. Economou, D. V. Lopaev, and T. V. Rakhimova, Plasma Sources Sci. Technol. 14, 532-542 (2005).
40. M. Shibata, N. Nakano, and T. Makabe, J. Appl. Phys. 80, 6142-6147 (1996).
41. J. T. Gudmundsson, A. M. Marakhtanov, K. K. Patel, V. P. Gopinath, and M. A. Lieberman, J. Phys. D: Appl. Phys. 33, 1323-1331 (2000).
42. R. Basner, F. Sigeneger, D. Loffhagen, G. Schubert, H. Fehske, and H. Kersten, New J. Phys. 11, 013041 (2009).
43. Ph. Belenguer and J. P. Boeuf, Phys. Rev. A 41, 4447-4459 (1990).