Analysis and kinetics of transient species in electrode near plasma and plasma boundary sheath of RF plasmas in molecular gases

Contributions to Plasma Physics

Volumn 45, Issue 5-6, 2005, Pages 369-377

  Geigl, M ^a   Peters, S ^a,b   Gabriel, O ^a   Krames, B ^a   Meichsner, J ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b Institute for Low Temperature Plasma Physics   (Germany)

Author keywords

Fluorocarbon plasma; Oxygen plasma; Radical kinetics; Rf plasma; Similarity parameter; Time resolved threshold ionization mass spectrometry; Two photon absorption laser induced fluorrecence spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; FLUORESCENCE SPECTROSCOPY; IONIZATION OF GASES; LASER PRODUCED PLASMAS; PHOTOIONIZATION; PHOTONS; PLASMA THEORY; TWO PHOTON PROCESSES;

FLUOROCARBON PLASMA; LASER INDUCED; OXYGEN PLASMAS; RADICAL KINETICS; RF PLASMA; SIMILARITY PARAMETER; THRESHOLD IONIZATION MASS SPECTROMETRY; TIME RESOLVED THRESHOLD IONIZATION MASS SPECTROMETRY; TIME-RESOLVED; TWO PHOTON ABSORPTION; TWO-PHOTON ABSORPTION LASER INDUCED FLUORRECENCE SPECTROSCOPY;

MASS SPECTROMETRY;

EID: 24944491762     PISSN: 08631042     EISSN: None     Source Type: Journal    
DOI: 10.1002/ctpp.200510042     Document Type: Article

References (25)

1. T.E.F.M. Standaert, M. Schaepkens et al., J. Vac. Sci. Technol. A 16 (1), (1998).
2. L. Ling, X. Hua et al., J. Vac. Sci. Technol. A 22 (2), (2004).
3. J.A. Theil, J. Vac. Sci. Technol. B 17 (6), (1999).
4. T.E.F.M. Standaert, C. Hedl, et al., J. Vac. Sci. A 22 (1), (2004).
5. J. Baggermann, R. Visser, E. Collart, J. Appl. Phys.75 (2), 758 (1994).
6. D. Bamford, L. Jusinski, W. Bischel, Phys. Rev. E 34 (1), 185 (1986).
7. S. Gomez, P. Steen, G. Graham, Appl. Phys. Lett. 81, 19 (2002).
8. A. Tserepi, T. Miller, J. Appl. Phys. 77, 505 (1995).
9. P. Kae-Nune, J. Perrin, J. Guillon, J. Jolly, Plasma Sources Sci. Technol. 4, 250 (1995).
10. H. Sugai, H. Toyoda, J. Vac. Sci. Technol. A 10 (4), 1193 (1992).
11. A.D. Tserepi, W. Schwarzenbach, J. Derouard, N. Sadeghi, J. Vac. Sci. Technol. A 15 (6), 3120 (1997).
12. L. Cherigier, U. Czarnetzki, D. Luggenhölscher, V. Schulz-von der Gathen, J. Appl. Phys. 85 (2), 696 (1999).
13. A. Goehlich, T. Kawetzki, H. Döbele, J. Chem. Phys. 108, 9362 (1998).
14. K. Niemi, V.S. van der Gathen, H. Döbele, J. Phys. D: Appl. Phys. 34, 2330 (2001).
15. H. Singh, J. W. Coburn, D. B. Graves, J. Vac. Sci. Technol. A 17 (5), (1999).
16. W.H. Press, S.A. Teukolsky, W.T. Vetterling, B.P. Flannery, Numerical recipes in C: the art of scientific computing, 15.4. Cambridge University Press, 2. Ausg. (2002).
17. N. Mutsukura, K. Kobayashi, Y. Machi, J. Appl. Phys. 68 (6), 2657 (1995).
18. E.J.H. Collart, J. Visser, J.A.G. Baggermann, J. Appl. Phys. 78 (7), 47 (1995).
19. 2-Triplett-Zuständen im elektrodennahen Plasma einer Rf-Niederdruckentladung, Ph.D. thesis, TU Chemnitz, Germany, (2000);
20. B. Krames, T. Glenewinkel-Meyer, J. Meichsner, J. Phys. D: Appl. Phys. 34, 1789-1798 (2001).
21. C. Collard, S. Shannon, J.P. Holloway, M.L. Brake, IEEE Transactions on Plasma Science 28 (6), 2187 (2000).
22. K.L. Steffens, M.A. Sobolewski, J. Va, Sci. Technol. A 17 (2), 517 (1999).
23. B.A. Cruden, K. K. Gleason, H.H. Sawin, J. Vac. Sci. Technol. B 20 (2), 690 (2002).
24. NIST Chemistry WebBook, NIST Standard Reference Database Number 69, http://webbook.nist.gov/chemistry
25. O. Gabriel, K. Li, J. Meichsner; Conference Proceedings, P. 229-230, ESCAMPIG 17, Constanta, Romania, 1-5 September 2004