메뉴 건너뛰기




Volumn 50, Issue 10, 2010, Pages 942-953

Excitation Mechanisms and Sheath Dynamics in Capacitively Coupled Radio-Frequency Oxygen Plasmas

Author keywords

Excitation mechanisms; Oxygen; PIC MCC simulations; PROES; RF discharges; Sheath dynamics

Indexed keywords

ELECTRIC DISCHARGES; EXCITED STATES; MOLECULAR OXYGEN; OPTICAL EMISSION SPECTROSCOPY; PHOTODISSOCIATION; POSITIVE IONS; RADIO WAVES;

EID: 78449313629     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.201000038     Document Type: Article
Times cited : (40)

References (32)
  • 17
    • 85163249902 scopus 로고    scopus 로고
    • NIST National Institute of Standards and Technology, Atomic Spectra Data-base
    • NIST National Institute of Standards and Technology, Atomic Spectra Data-base (www.nist.gov)
  • 22
    • 85163245802 scopus 로고    scopus 로고
    • Principles of Plasma Discharges and Materials Processing (John Wiley & Sons, Inc., Hoboken, New Jersey, second edition, 2005).
    • M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (John Wiley & Sons, Inc., Hoboken, New Jersey, second edition, 2005).
    • Lieberman, M.A.1    Lichtenberg, A.J.2
  • 24
    • 85163245130 scopus 로고    scopus 로고
    • Phasenaufgelöste emissionsspektroskopische Untersuchung der Besetzungsdynamik angeregter Zustände in Wasserstoff-RF-Entladungen", PhD thesis, University of Duisburg-Essen, Germany (2001).
    • T. Gans, "Phasenaufgelöste emissionsspektroskopische Untersuchung der Besetzungsdynamik angeregter Zustände in Wasserstoff-RF-Entladungen", PhD thesis, University of Duisburg-Essen, Germany (2001).
    • Gans, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.