Detachment-induced electron production in the early afterglow of pulsed cc-rf oxygen plasmas

Physics of Plasmas

Volumn 19, Issue 7, 2012, Pages

  Kullig C ^a   Dittmann, K ^a   Meichsner, J ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC OXYGEN; DUTY CYCLES; ELECTRON PRODUCTION; ELECTROPOSITIVE PLASMAS; OPERATION MODE; OXYGEN MOLECULE; OXYGEN PLASMAS; PRESSURE RANGES; PROCESSING PARAMETERS; RATE-EQUATION MODELS; RF DISCHARGE; RF-POWER; SELF BIAS VOLTAGE; TEMPORAL BEHAVIOR;

BIAS VOLTAGE; CARRIER CONCENTRATION; CHEMICAL BONDS; ELECTRON DENSITY MEASUREMENT; ELECTRONEGATIVITY; ELECTRONS; GAUSSIAN BEAMS; OXYGEN; PLASMAS;

ELECTRIC DISCHARGES;

EID: 84866927385     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4737196     Document Type: Article

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