Electron density oscillations in CC-RF oxygen plasma investigated by gaussian beam microwave interferometry

IEEE Transactions on Plasma Science

Volumn 39, Issue 11 PART 1, 2011, Pages 2564-2565

  Kullig, Christian ^a   Dittmann, Kristian ^a   Meichsner, Jrgen ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Electrons; interferometry; plasma diagnostics; plasma stability

Indexed keywords

BEAM WAIST; CAPACITIVELY COUPLED; ELECTRON DENSITIES; IONIZATION INSTABILITY; MODEL ASSUMPTIONS; OXYGEN PLASMAS; RADIO FREQUENCIES; RF-POWER; TOTAL PRESSURE;

CARRIER CONCENTRATION; ELECTRON DENSITY MEASUREMENT; GAUSSIAN BEAMS; INTERFEROMETRY; MICROWAVE OSCILLATORS; OXYGEN; PLASMA DIAGNOSTICS; PLASMA STABILITY; PLASMAS;

ELECTRONS;

EID: 81255158704     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2011.2156430     Document Type: Article

References (4)

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2. H.-M. Katsch, A. Goehlich, T. Kawetzki, E. Quandt, and H.-F. Döbele, "Attachment-induced ionization instability of a radio frequency excited discharge in oxygen", Appl. Phys. Lett., vol. 75, no. 14, pp. 2023-2025, Oct. 1999.
3. W. L. Nighan and W. J. Wiegand, "Influence of negative-ion processes on steady-state properties and striations in molecular gas discharges", Phys. Rev. A, vol. 10, no. 3, pp. 922-945, Sep. 1974.
4. C. Küllig, K. Dittmann, and J. Meichsner, "A novel approach for negative ion analysis using 160 GHz microwave interferometry and laser photodetachment in oxygen CC-RF plasmas", Plasma Sources Sci. Technol., vol. 19, no. 6, p. 065011, Dec. 2010.