Crystalline vanadium nitride ultra-thin films obtained at room temperature by pulsed laser deposition

Surface and Coatings Technology

Volumn 211, Issue , 2012, Pages 158-162

  Ghimbeu, C Matei ^a   Sima, F ^a,b   Ostaci, R V ^a   Socol, G ^b   Mihailescu, I N ^b   Vix Guterl, C ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Deposition; Pulsed laser; Ultra thin films; Vanadium nitride

Indexed keywords

DEPOSITION CONDITIONS; LOW TEMPERATURES; OXIDE LAYER; POROUS MORPHOLOGY; PULSED-LASER DEPOSITION TECHNIQUE; ROOM TEMPERATURE; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; SI SUBSTRATES; SOLID TARGETS; TEMPERATURE-PROGRAMMED REDUCTION; VANADIUM NITRIDES;

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DEPOSITION; NITRIDES; OXIDE FILMS; PHOTOELECTRONS; PULSED LASER DEPOSITION; PULSED LASERS; SOL-GELS; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; VANADIUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

LASERS;

EID: 84868631639     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.08.019     Document Type: Article

References (37)

1. Parkin I.P., Elwin G.S. J. Mater. Chem. 2001, 11:3120.
2. Gueddaoui H., Schmerber G., Abes M., Guemmaz M., Parlebas J.C. Catalysis Today 2006, 113:270.
3. Gueddaoui H., Maabed S., Schmerber G., Guemmaz M., Parlebas J.C. Eur. Phys. J. B. 2007, 60:305.
4. Fateh N., Fantalvo G.A., Mitterer C. Tribol. Lett. 2008, 30:21.
5. Qu X.-P., Zhou M., Chen T., Xie Q., Ru G.-P., Li B.-Z. Microelectron. Eng. 2006, 83:236.
6. Oyama S.T. J. Catalysis 1999, 133:358.
7. Sun Q., Fu Z.-W. Electrochem. Acta 2008, 54:403.
8. Choi D., Blomgre G.E., Kumpta P.N. Adv. Mater. 2006, 18:1179.
9. Chu X., Barnett S.A., Wong M.S., Sproul W.D. J. Vac. Sci. Technol. A 1996, 14:3124.
10. Berendes A., Galesic I., Mertens R., Bock W., Oechsner H., Warbichler P., Hofer F., Theodossiu E., Baumann H., Kolbesen B.O. Z. Anorg. Allg. Chem. 2003, 629:1769.
11. D'Anna E., Di Cristoforo A., Fernandez M., Leggieri G., Luches A., Majni G., Mengucci P., Nanai L. Appl. Surf. Sci. 2002, 186:496.
12. Dai Z.N., Miyashita A., Yamamoto S., Narumi K., Naramoto H. Thin Solid Films 1999, 347:117.
13. Dai Z.N., Miyashita A., Yamamoto S., Narumi K., Naramoto H. J. Phys.: Condes. Matter. 1999, 11:733.
14. Chrisey D.B., Hubler G.K. Pulsed Laser Deposition of Thin films 1994, Wiley, New York.
15. Craciun D., Socol G., Stefan N., Mihailescu I.N., Brurne G., Craciun V. Surf. Coat. Technol. 2009, 203:1055.
16. Taberna P.L., Simon P., Flahaut E. J. Electrochem. Soc. 2006, 153:A649.
17. Fontenot C.J., Wiench J.W., Pruski H., Schrader G.L. J. Phys. Chem. B 2000, 104:116.
18. Lee K., Cao G. J. Phys. Chem. B 2010, 109:11880.
19. Matei Ghimbeu C., Raymundo-Pinero E., Fioux F., Béguin F., Vix-Guterl C. J. Mater. Chem. 2011, 21:13268.
20. Ma C.-H., Huang J.-H., Chen H. Surf. Coat. Technol. 2000, 133-134:289.
21. Schubert W.K., Shelton R.N., Wolf E.L. Phys. Rev. B 1981, 23:5097.
22. Liste S., Gonzales P., Serra J., Borrajo J.P., Chiussi S., Leon B., Perez-Amor M., Garcia Lopez J., Ferrer F.J., Morilla Y., Raspaldiza M.A. Thin Solid Films 2004, 453-454:219.
23. Dorcioman G., Ebrasu D., Enculescu I., Serban N., Axente E., Sima F., Ristoscu C., Mihailescu I.N. J. Power Sources 2010, 195:7776.
24. Sima F., Ristoscu C., Stefan N., Dorcioman G., Mihailescu I.N., Sima L.E., Petrescu S.M., Palcevskis E., Krastins J., Zalite I. Appl. Surf. Sci. 2009, 255:5312.
25. Coetsee E., Terblans J.J., Swart H.C. Physica B 2009, 404:4431.
26. Hino T., Nishida N.M., Akari T. Surf. Coat. Technol. 2002, 149:1.
27. Fleming A.J., Sumev F.P., Netzer F.P. J. Appl. Phys. 2007, 102:084902.1.
28. Pandey S.K., Thakur O.P., Raman R., Goyal A., Gupta A. Appl. Surf. Sci. 2011, 257:6833.
29. Aziz M.J. Appl. Phys. A 2008, 93:579.
30. Zhang D.M., Guan L., Li Z.H., Pan G.J., Zun H.Z., Tan X.Y., Li L. Surf. Coat. Technol. 2006, 200:4027.
31. Ramana C.V., Smith R.J., Hussain O.M., Juliean C.M. Mater. Sci. Eng. B 2004, 111:218.
32. Rijnders G., Blank D. 2006, Ch. 8. Wiley (Ed.).
33. Bondarenka V., Grebinskij S., Mickevicius S., Tvardauskas H., Kaciulis S. J. Alloys Compd. 2004, 382:239.
34. Glushenkov A.M., Hulicova-Jurcakova D., Llewellyn D., Lu G.Q., Chen Y. Chem. Mater. 2010, 22:914.
35. Chen H., Shu D., Nan J. J. Phys. Chem. Solids 2009, 70:495.
36. Glaser A., Surnev S., Netzer F.P., Fateh N., Fantalvo G.A., Mitterer C. Surf. Sci. 2007, 601:1153.
37. Mendioldua J., Casanova R., Barbaux Y. J. Electron Spectr. Related Phenom. 1995, 71:249.