Structural and optical properties of vanadium and hafnium nitride nanoscale films: Effect of stoichiometry

European Physical Journal B

Volumn 60, Issue 3, 2007, Pages 305-312

  Gueddaoui, H ^a,b   Maabed, S ^a   Schmerber, G ^c   Guemmaz, M ^a   Parlebas, J C ^c  

^a FERHAT ABBAS UNIVERSITY   (Algeria)

^b UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

^c INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHIC FILM STRUCTURES; NANOSCALE FILMS; STOICHIOMETRIC HAFNIUM NITRIDES; STOICHIOMETRIC VANADIUM NITRIDES; SYNTHESIZED FILMS; WAVE DISPERSION SPECTROSCOPY (WDS);

CRYSTAL MICROSTRUCTURE; HAFNIUM COMPOUNDS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SILICON WAFERS; STOICHIOMETRY; STRUCTURAL PROPERTIES; X RAY DIFFRACTION;

ULTRATHIN FILMS;

EID: 38149099390     PISSN: 14346028     EISSN: 14346036     Source Type: Journal    
DOI: 10.1140/epjb/e2006-00350-9     Document Type: Article

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