Crystalline and nearly stoichiometric vanadium nitride thin film by PLD

Thin Solid Films

Volumn 347, Issue 1-2, 1999, Pages 117-120

  Dai, Z N ^a   Miyashita, A ^a   Yamamoto, S ^a   Narumi, K ^a   Naramoto, H ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTALLINE MATERIALS; DEPOSITION; NITROGEN; PRESSURE; PULSED LASER APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; TEMPERATURE; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS;

PULSED LASER DEPOSITION; STOICHIOMETRIC GROWTH; VANADIUM NITRIDE THIN FILM; X RAY DIFFRACTOMETER POLE FIGURE;

THIN FILMS;

EID: 0344771135     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01726-X     Document Type: Article

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